Method for increasing maximum modulation speed of a light emitting device, and light emitting device with increased maximum modulation speed and quantum well structure thereof

1. A method for increasing the maximum modulation speed of a light emitting device, the method comprising:

forming barrier layers of AlGaAs;

forming an quantum well layer of InGaAs between said barrier layers; and

forming an interfacial layer between said quantum well layer and each of said barrier layers, wherein said interfacial layers are formed of at least one of GaAs and AlGaAs, and wherein said forming said interfacial layer comprises forming said interfacial layer of AlGaAs having a lower aluminum fraction than said AlGaAs of said barrier layers.

2. The method of claim 1 , wherein said InGaAs of said quantum well layer has an indium fraction greater than 20 percent.

3. The method of claim 1 , wherein:

said forming said quantum well layer comprises forming a plurality of quantum well layers of InGaAs, said quantum well layers interleaved with said barrier layers; and

said forming said interfacial layer comprises forming an interfacial layer between each of said quantum well layers and adjacent ones of said barrier layers.

4. The method of claim 1 , wherein said forming said barrier layers comprises forming said barrier layers of AlGaAs having an aluminum fraction greater than 5 percent.

5. The method of claim 1 , additionally comprising structuring said light-emitting device to generate light at a wavelength of 980 nm.

6. A vertical cavity surface emitting laser (VCSEL), comprising:

a quantum well structure comprising quantum well layers of InGaAs interleaved with barrier layers of AlGaAs; and

an interfacial layer between each of said quantum well layers and adjacent ones of said barrier layers for increasing carrier confinement in said quantum well structure, said increased carrier confinement increasing the maximum modulation speed of said VCSEL, wherein said interfacial layers are formed of at least one of GaAs and AlGaAs, and wherein said interfacial layers comprise AlGaAs having a lower aluminum fraction than said AlGaAs of said barrier layers.

7. The VCSEL of claim 6 , wherein said interfacial layers are additionally for reducing a broadening of the gain spectrum of said quantum well structure caused by imperfect interfacing between said quantum well layers and said barrier layers.

8. The VCSEL of claim 6 , wherein said interfacial layers comprise an increased density of quantum wells in said quantum well structure.

9. The VCSEL of claim 6 , wherein said AlGaAs of said barrier layers has an aluminum fraction greater than 5 percent.

10. The VCSEL of claim 6 , wherein said InGaAs of said quantum well layers has an indium fraction of greater than 20 percent.

11. The VCSEL of claim 6 , structured to generate light at a wavelength of 980 nm.

12. A quantum well structure for a light emitting device, the quantum well structure comprising:

barrier layers comprising AlGaAs having an aluminum fraction greater than 5 percent;

InGaAs quantum well layers interleaved with said barrier layers; and

between each one of said quantum well layers and each adjacent one of said barrier layers, an interfacial layer of a material that mitigates the effect of imperfect interfacing between said one of said quantum well layers and said adjacent one of said barrier layers, wherein said interfacial layers are formed of at least one of GaAs and AlGaAs, and wherein said interfacial layers comprise AlGaAs having an aluminum fraction less than said aluminum fraction of said AlGaAs of said barrier layers.

13. The quantum well structure of claim 12 , wherein said interfacial layers are configured to increase the effective carrier capture cross-section of a quantum well comprised of said one of said quantum well layers and said adjacent ones of said barrier layers.

14. A quantum well structure for a light emitting device, the quantum well structure comprising:

barrier layers;

InGaAs quantum well layers interleaved with said barrier layers; and

between each one of said quantum well layers and each adjacent one of said barrier layers, an interfacial layer of a material that mitigates the effect of imperfect interfacing between said one of said quantum well layers and said adjacent one of said barrier layers, wherein said interfacial layers are formed of at least one of GaAs and AlGaAs wherein said barrier layers each comprise GaAsP.

15. The quantum well structure of claim 12 , structured to generate light at 980 nm.