Stimulus-sensitive composition, compound and pattern formation method using the stimulation-sensitive composition

1. A stimulus-sensitive composition comprising a compound that generates one of an acid and a radical by external stimulation, the compound being represented by formula (I′):

wherein Y represents an aryl group, an alkyl group, a cycloalkyl group, an alkenyl group, a —C(═O)—Y 3a group or a —Y 3b —C(═O)—Y 3c group, wherein Y 3a and Y 3c each represents an alkyl group, a cycloalkyl group, an aryl group, an alkenyl group, an alkoxy group, an aryloxy group, a hydroxyl group, a —NR 3 R 4 group, a —NHC(═O)—R 3 group or a —NHSO 2 R 3 group, wherein R 3 and R 4 each independently represents a hydrogen atom, an alkyl group or a cycloalkyl group, and Y 3b represents a divalent linking group resulting from removal of one hydrogen atom from the Y 3a ,

R 1 ′ and R 2 ′ each independently represents a hydrogen atom, an alkyl group or a cycloalkyl group,

Y 3 and Y 4 each independently represents an alkyl group or a cycloalkyl group,

X − represents a non-nucleophilic anion,

m represents 0 or 1, and

n represents 1 or 2,

provided that m+n=2.

2. A pattern forming method comprising:

forming a resist film by using the stimulus-sensitive composition according to claim 1 ; and

exposing and developing the resist film.

3. The stimulus-sensitive composition according to claim 1 , further comprising at least one of (F) a basic compound and (G) a surfactant containing at least one of a fluorine and a silicon.

4. The stimulus-sensitive composition according to claim 3 , wherein (F) the basic compound is one of (i) a compound having a structure selected from an imidazole structure, a diazabicyclo structure, an onium hydroxide structure, an onium carboxylate structure, a trialkylamine structure, an aniline structure and a pyridine structure, (ii) an alkylamine derivative having at least one of a hydroxyl group and an ether bond, and (iii) an aniline derivative having at least one of a hydroxyl group and an ether bond.

5. A compound represented by formula (I′):

wherein Y represents an aryl group, an alkyl group, a cycloalkyl group, an alkenyl group, a —C(═O)—Y 3a group or a —Y 3b —C(═O)—Y 3c group, wherein Y 3a and Y 3c each represents an alkyl group, a cycloalkyl group, an aryl group, an alkenyl group, an alkoxy group, an aryloxy group, a hydroxyl group, a —NR 3 R 4 group, a —NHC(═O)—R 3 group or a —NHSO 2 R 3 group, wherein R 3 and R 4 each independently represents a hydrogen atom, an alkyl group or a cycloalkyl group, and Y 3b represents a divalent linking group resulting from removal of one hydrogen atom from the Y 3a ,

R 1 ′ and R 2 ′ each independently represents a hydrogen atom, an alkyl group or a cycloalkyl group,

Y 3 and Y 4 each independently represents an alkyl group or a cycloalkyl group,

X − represents a non-nucleophilic anion,

m represents 0 or 1, and

n represents 1 or 2,

provided that m+n=2.

6. A positive stimulus-sensitive composition comprising:

(A) a compound that generates an acid upon irradiation with an actinic ray, according to claim 4 ; and

(B) a resin that increases a solubility of the resin in an alkali developer by an action of an acid.

7. The positive stimulus-sensitive composition according to claim 6 , wherein the resin (B) has a fluorine atom in the main or side chain.

8. The positive stimulus-sensitive composition according to claim 6 , wherein the resin (B) has a hexafluoro-isopropanol structure.

9. The positive stimulus-sensitive composition according to claim 6 , wherein the resin (B) has a hydroxystyrene structure.

10. The positive stimulus-sensitive composition as according to claim 6 , wherein the resin (B) has a monocyclic or polycyclic alicyclic hydrocarbon structure.

11. The positive stimulus-sensitive composition according to claim 10 , wherein the resin (B) further has a lactone structure.

12. The positive stimulus-sensitive composition according to claim 6 , further comprising (C) a dissolution inhibiting compound that increases a solubility of the compound (C) by an action of an acid, the compound (C) having a molecular weight of 3,000 or less.

13. A positive stimulus-sensitive composition comprising:

(A) a compound that generates an acid upon irradiation with an actinic ray, according to claim 4 ;

(D) a resin soluble in an alkali developer; and

(C) a dissolution inhibiting compound that increases a solubility of the compound (C) by an action of an acid, the compound (C) having a molecular weight of 3,000 or less.

14. A negative stimulus-sensitive composition comprising:

(A) a compound that generates an acid upon irradiation with an actinic ray, according to claim 4 ;

(D) a resin soluble in an alkali developer; and

(E) an acid crosslinking agent that cross-links with the alkali developer-soluble resin by an action of an acid.