Particle deposition system and method
View Patent ↗A deposition system for depositing a chemical vapor onto a workpiece, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The deposition chamber includes an inner skin made of Hasteloy for sealing the plurality of components and the workpiece from the air surrounding the deposition system, and an outer skin that encloses the inner skin and is separated from the inner skin by an air gap. The outer skin includes vents that create a convection current in the air gap between the inner skin and outer skin of the deposition chamber. The deposition system also has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber.
1. A method of depositing silica particles onto a workpiece comprising the steps of:
(a) obtaining a workpiece;
(b) depositing silica particles on the workpiece;
(c) translating the workpiece relative to the depositing of silica particles; wherein the translating step is performed by selectively translating the workpiece relative to the deposition at a rate greater than about 3.0 meters per minute; and
(d) selectively causing a relative acceleration between an end of the workpiece and the deposition, the relative acceleration having an absolute magnitude of at least about 250 mm/sec 2 .
2. The method of claim 1 , wherein the depositing step further comprises a step of rotating the workpiece.
3. The method of claim 1 , wherein the workpiece is translated according to a motion profile.
4. The method of claim 1 , wherein the workpiece is selectively translated at a rate of at least about seven meters per minute.
5. The method of claim 1 wherein the silica is doped silica.
6. A method of depositing silica particles onto a workpiece comprising the steps of:
(a) obtaining a workpiece;
(b) depositing silica particles on the workpiece;
(c) translating the workpiece relative to the depositing of silica particles; wherein the translating step is performed by selectively causing a relative translation between the workpiece and the deposition of greater than about 3.0 meters per minute; and
(d) selectively causing a relative acceleration between an end of the workpiece and the deposition, the relative acceleration having an absolute magnitude of at least about 250 mm/sec 2 .
7. The method of claim 6 , wherein the depositing step further comprises a step of rotating the workpiece.
8. The method of claim 6 , wherein the workpiece is translated according to a motion profile.
9. The method of claim 6 , wherein the relative translation between the workpiece and the deposition is selectively greater than about seven meters per minute.
10. The method of claim 6 wherein the silica is doped silica.