IP Library Granted Patent US 7,273,639
Granted Patent B2
US 7,273,639 · App. 10/900,356 · Granted Sep 25, 2007

Protective film for protecting a dielectric layer of a plasma display panel from discharge, method of forming the same, plasma display panel and method of manufacturing the same

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Quick Facts
Patent No.
US 7,273,639
App. No.
10/900,356
Granted
Sep 25, 2007
Kind
B2
Abstract

A protective film for protecting a dielectric layer of a plasma display panel from discharge contains a metallic oxide. A volume resistivity of the protective film is 3.5×10 11 Ω·cm or more.

Claims (27)

1. A method of forming a protective film protecting a dielectric layer of a plasma display panel from discharge, comprising the steps of:

forming a metallic oxide film in atmosphere containing no hydrogen; and subsequently performing a heat treatment of said metallic oxide film in atmosphere including hydrogen in excited or ionized state.

2. A method of manufacturing a plasma display panel, comprising the step of forming a protective film by the method according to claim 1 .

3. A method of forming a protective film protecting a dielectric layer of a plasma display panel from discharge, comprising the step of:

forming a film containing a metallic oxide in atmosphere containing no hydrogen; and subsequently performing a heat treatment of said film in atmosphere including hydrogen in excited or ionized state.

4. method of manufacturing a plasma display panel, comprising the step of:

forming a protective film by the method according to claim 3 .

5. A method of forming a protective film of a plasma display panel, comprising the steps of:

forming a metallic oxide film on a substrate by irradiating an electronic beam onto a deposition source in atmosphere containing no hydrogen while introducing an oxygen gas; and

subsequently applying a heat treatment to the metallic oxide film in atmosphere including hydrogen in an excited or ionized state.

6. The method of claim 5 , wherein said heat treatment is conducted by introducing an oxygen gas and vapor into a chamber in which said substrate is provided, and controlling the partial pressure ratio of the oxygen has and the hydrogen gas by dissociating the vapor into a hydrogen gas and an oxygen gas by plasmas generated by the electron beam.

7. The method of forming a protective film of a plasma display panel according to claim 6 , wherein said metallic oxide film is also formed on a member that conveys the substrate between the outside and the inside of the chamber, wherein said member is extracted from the chamber to absorb moisture in the metal oxide film, and thereafter, the member is put into the chamber together with the substrate and disperse the vapor absorbed in the metal oxide film inside the chamber.

8. The method of forming a protective film of a plasma display panel according to claim 7 , wherein the metallic oxide film is an MgO film.

9. The method of forming a protective film of a plasma display panel according to claim 6 , wherein the partial pressure ratio of the hydrogen gas and the oxygen gas is controlled between 0.3 and 1.

10. The method of forming a protective film of a plasma display panel according to claim 9 , wherein the metallic oxide film is an MgO film.

11. The method of forming a protective film of a plasma display panel according to claim 6 , wherein the metallic oxide film is an MgO film.

12. The method of forming a protective film of a plasma display panel according to claim 6 , wherein the heat treatment is applied subsequent to forming the metallic oxide film on the substrate.

13. The method of forming a protective film of a plasma display panel according to claim 5 , wherein the metallic oxide film is an MgO film.

14. The method of claim 5 , wherein said heat treatment is conducted by introducing an oxygen gas and a hydrogen gas into a chamber in which said substrate is provided, and controlling the partial pressure ratio of the oxygen gas and the hydrogen gas.

15. The method of forming a protective film of a plasma display panel according to claim 14 , wherein the partial pressure ratio of the hydrogen gas and the oxygen gas is controlled between 0.3 and 1.

16. The method of forming a protective film of a plasma display panel according to claim 15 , wherein the metallic oxide film is an MgO film.

17. The method of forming a protective film of a plasma display panel according to claim 14 , wherein the metallic oxide film is an MgO film.

18. The method of forming a protective film of a plasma display panel according to claim 14 , wherein the heat treatment is applied subsequent to forming the metallic oxide film on the substrate.

19. A method of forming a protective film of a plasma display panel, comprising the steps of:

forming a metallic oxide film on a substrate by irradiating an electronic beam onto a deposition source in atmosphere containing no hydrogen while introducing an oxygen gas; and

subsequently applying a heat treatment to the metallic oxide film in atmosphere including vapor.

20. The method of claim 19 , wherein said heat treatment is conducted by dissociating the vapor into a hydrogen gas and an oxygen gas by plasmas generated by the electronic beam.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 15, 2009
From: PIONEER CORPORATION (FORMERLY CALLED PIONEER ELECTRONIC CORPORATION)
To: PANASONIC CORPORATION
Reel/Frame 023234/0173 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 14, 2005
From: PIONEER PLASMA DISPLAY CORPORATION
To: PIONEER CORPORATION
Reel/Frame 016334/0922 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 7, 2004
From: NEC PLASMA DISPLAY CORPORATION
To: PIONEER PLASMA DISPLAY CORPORATION
Reel/Frame 016038/0801 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 22, 2004
From: NEC CORPORATION
To: NEC PLASMA DISPLAY CORPORATION
Reel/Frame 015924/0751 →