Layered electron beam column and method of use thereof
View Patent ↗An electron beam column package comprises a plurality of layers having components, such as lenses, coupled thereto. The layers may be made of LTCC, HTCC or other layer technology.
1. A charged particle beam column package, comprising:
a plurality of layers, at least one of the layers having interconnects thereon; and
a component coupled to at least one of the layers;
wherein the plurality of layers is made from LTCC or HTCC;
wherein the plurality of layers have fiducials thereon to enable component-to-component and component-to-column alignment.
2. The charged particle beam column package of claim 1 , further comprising passive or active devices on at least one of the plurality of layers.
3. The charged particle beam column package of claim 1 , wherein the column has an hourglass shape.
4. The charged particle beam column package of claim 1 , wherein the column has a tapered shape.
5. The charged particle beam column package of claim 1 , wherein each layer has two surfaces available for the interconnects.
6. The charged particle beam column package of claim 1 , wherein the interconnects are terminated at at least two pads located in the column package through vias and interconnects in each layer to create electrical continuity with external equipment.
7. A scanning microscope incorporating the charged particle beam column package of clam 1 .
8. A lithography tool incorporating the charged particle beam column package of claim 1 .
9. An analysis tool incorporating the charged particle beam column package of claim 1 .
10. An inspection tool incorporating the charged particle beam column package of claim 1 .
11. A method, comprising:
generating a charged particle beam;
focusing the beam within a charged particle beam column package, the beam column package having a plurality of layers, at least one of the layers having interconnects thereon, and a component coupled to at least one of the layers, wherein the plurality of layers is made from LTCC or HTCC, wherein the plurality of layers have fiducials thereon to enable component-to-component and component-to-column alignment; and
scanning the beam over a target.
12. The method of claim 11 , further comprising passive or active devices on at least one of the plurality of layers.
13. The method of claim 11 , wherein the column package has an hourglass shape.
14. The method of claim 11 , wherein the column package has a tapered shape.
15. The method of claim 11 , wherein each layer has two surfaces available for the interconnects.
16. The method of claim 11 , wherein the interconnects are terminated at at least two pads located in the column package through vias and interconnects in each layer to create electrical continuity with external equipment.
17. The method of claim 11 , further comprising:
collecting electrons or photons from the target; and
generating an image based on the collected electrons or photons.
18. The method of claim 11 , wherein the target is a wafer and wherein the scanning imprints a pattern onto the wafer for a circuit.
19. The beam column package of claim 1 , wherein one of the layers supports two lens assemblies.
20. The beam column package of claim 19 , wherein the layer supporting two lens assemblies supports one of the lens assemblies at a top surface of the layer and supports the other layer at a bottom surface of the layer.
21. A method, comprising:
generating a charged particle beam;
focusing the beam within a charged particle beam column package, the beam column package having a plurality of ceramic layers, at least one of the layers having printed interconnects thereon; and a lens assembly supported by one of the layers; and
scanning the beam over a target.
22. The method of claim 21 , wherein one of the layers supports two lens assemblies.
23. The method of claim 22 , wherein the layer supporting two lens assemblies supports one of the lens assemblies at a top surface of the layer and supports the other layer at a bottom surface of the layer.