Thin film magnetic head and magnetic storage apparatus
A thin film magnetic head and a method of manufacture thereof, wherein the head includes a lower magnetic pole, an upper magnetic pole provided so as to face the lower magnetic pole, and a magnetic gap layer provided between the lower magnetic pole and the upper magnetic pole. The upper magnetic pole is formed by a sputtered first magnetic layer which is an underlayer and a plated second magnetic layer provided on the sputtered first magnetic layer.
1 . A method for manufacturing a thin film magnetic head including a lower magnetic pole, an upper magnetic pole provided so as to face the lower magnetic pole, and a magnetic gap layer provided between the lower magnetic pole and the upper magnetic pole, wherein the upper magnetic pole is formed by the steps of:
depositing by sputtering a first magnetic layer; and
depositing by electroplating a second magnetic layer on the sputtered first magnetic layer.
2 . A method according to claim 1 , wherein the sputtered first magnetic layer contains Co, Ni and Fe as 10≦Co≦80 wt %, 0≦Ni≦25%, and 15≦Fe≦90 wt %.
3 . A method according to claim 1 , wherein the electroplated second magnetic layer contains Co, Ni and Fe as 10≦Co≦80 wt %, 0≦Ni≦25%, 15≦Fe≦90 wt %.
4 . A method according to claim 1 , wherein the electroplated second magnetic layer is formed by use of a plating bath containing saccharin sodium in a plating solution thereof.
5 . A method according to claim 4 , wherein the content of the saccharin sodium contained in the plating bath is set to 0.5-2 g/l.
6 . A thin film magnetic head comprising a lower magnetic pole, an upper magnetic pole provided so as to face the lower magnetic pole, and a magnetic gap layer provided between the lower magnetic pole and the upper magnetic pole, wherein:
the upper magnetic pole includes a magnetic underlayer formed on a side facing the magnetic gap layer and a magnetic layer formed on the magnetic underlayer;
wherein a saturation magnetic flux density of the magnetic underlayer is higher than a saturation magnetic flux density of the magnetic layer.
7 . A thin film magnetic head according to claim 6 , wherein a density of Fe contained in the magnetic underlayer is higher than a density of Fe contained in the magnetic layer.
8 . A thin film magnetic head according to claim 7 , wherein the magnetic underlayer and the magnetic layer contain CoNiFe or CoFe, and the composition of CoNiFe or CoFe is set as 10≦Co≦80 wt %, 0≦Ni≦25 wt %, and 15≦Fe≦90 wt %.
9 . A thin film magnetic head according to claim 6 , wherein the magnetic underlayer is a sputtered magnetic underlayer, and the magnetic layer is a plated magnetic layer.
10 . A thin film magnetic head comprising a lower magnetic pole, an upper magnetic pole provided so as to face the lower magnetic pole, and a magnetic gap layer provided between the lower magnetic pole and the upper magnetic pole, wherein:
the upper magnetic pole includes a magnetic underlayer formed on a side facing the magnetic gap layer and a magnetic layer formed on the magnetic underlayer;
wherein a density of Fe contained in the magnetic underlayer is higher than a density of Fe contained the magnetic layer.
11 . A thin film magnetic head according to claim 10 , wherein a saturation magnetic flux density of the magnetic underlayer is higher than a saturation magnetic flux density of the magnetic layer.
12 . A thin film magnetic head according to claim 10 , wherein the magnetic underlayer and the magnetic layer contain CoNiFe or CoFe, and the composition of CoNiFe or CoFe is set as 10≦Co≦80 wt %, 0≦Ni≦25 wt %, and 15≦Fe≦90 wt %.
13 . A thin film magnetic head according to claim 10 , wherein the magnetic underlayer is a sputtered magnetic underlayer, and the magnetic layer is a plated magnetic layer.