Apparatus and method for depositing a material on a substrate
View Patent ↗Apparatus and a method for depositing a material on a substrate utilizes a distributor including a permeable member through which a carrier gas and a material are passed to provide a vapor that is deposited on a conveyed substrate. A secondary gas can be provided to promote uniform distribution of the material on the substrate.
1. An apparatus for depositing a material on a substrate, comprising:
a permeable member configured to be heated to a delivery temperature and to substantially uniformly distribute the material along the length of said permeable member as the material exits said permeable member;
a material supply conduit connected to said permeable member for supplying a carrier gas and a material to said permeable member;
a secondary gas supply having at least one orifice internal to said permeable member configured to supply a secondary gas to said permeable member, the secondary gas supply configured to provide a uniform gas flow through the walls of said permeable member; and
a conveyor configured to convey a substrate adjacent said permeable member,
wherein said secondary gas supply has a generally tubular shape and is contained within the permeable member,
wherein said permeable member is configured to be connected to a source of electrical power to heat the permeable member to the delivery temperature,
and, wherein the material supply conduit includes at least one of a rotary screw or a vibratory feeder and a gas passage into which the rotary screw or the vibratory feeder is configured to introduce a powder of the material for flow with the carrier gas.
2. The apparatus of claim 1 , wherein the permeable member has a generally tubular shape, and the material supply conduit is configured to introduce the carrier gas and the material to an interior portion of the permeable member.
3. The apparatus of claim 2 , further including a shroud having a generally tubular shape that receives the permeable member, the shroud having an opening through which the vapor passes for the deposition on the substrate.
4. The apparatus of claim 3 , wherein the opening of the shroud is a slit that extends along the length of the shroud.
5. The apparatus of claim 4 , wherein the shroud has opposite ends between which the slit has a varying size.
6. The apparatus of claim 3 , wherein the shroud includes a ceramic material.
7. The apparatus of claim 6 , wherein the ceramic material is mullite.
8. The apparatus of claim 2 , wherein the material supply conduit is configured to introduce the carrier gas and the material into one end of the permeable member.
9. The apparatus of claim 8 , further including a second material supply conduit configured to introduce the carrier gas and the material into the other end of the permeable member.
10. The apparatus of claim 1 , wherein the permeable member is a tube including silicon carbide.
11. The apparatus of claim 1 , wherein the orifice is a hole.
12. The apparatus of claim 1 , wherein the orifice is a nozzle.
13. The apparatus of claim 1 , wherein the secondary gas supply includes a plurality of orifices.
14. The apparatus of claim 13 , wherein the plurality of orifices is configured to provide a substantially uniform distribution of a vapor of the material from the permeable member.
15. The apparatus of claim 13 , wherein the plurality of orifices are configured to provide a substantially uniform flow of gas from the permeable member.
16. The apparatus of claim 1 , wherein the plurality of orifices are positioned at regular intervals along a length of the secondary gas supply.
17. The apparatus of claim 1 , wherein the plurality of orifices are positioned at irregular intervals along a length of the secondary gas supply.
18. The apparatus of claim 1 , wherein the apparatus includes a plurality of secondary gas supplies, each secondary gas supply having at least one orifice internal to the permeable member configured to supply a secondary gas to the permeable member.
19. The apparatus of claim 18 , wherein each secondary gas supply has a generally tubular shape and is contained within the permeable member, and the plurality of secondary gas supplies are generally parallel.
20. The apparatus of claim 19 , wherein a first secondary gas supply of the plurality has an orifice located in a zone along the tubular shape of the first secondary gas supply, wherein a corresponding zone along the tubular shape of a second secondary gas supply is free of an orifice.
21. The apparatus of claim 1 , wherein the conveyor supports the substrate in a horizontally extending orientation, and the permeable member being located above the conveyor.
22. The apparatus of claim 21 , wherein the conveyor includes a plurality of rollers.
23. The apparatus of claim 21 , wherein the permeable member is located above the conveyance path of the substrate to deposit the material on the upwardly facing surface of the substrate.
24. The apparatus of claim 1 , wherein the conveyor includes a gas hearth configured to support and convey the substrate in a generally horizontally extending orientation.