IP Library Granted Patent US 7,179,352
Granted Patent B2
US 7,179,352 · App. 10/926,942 · Granted Feb 20, 2007

Vacuum treatment system and process for manufacturing workpieces

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 7,179,352
App. No.
10/926,942
Granted
Feb 20, 2007
Kind
B2
Abstract

A process is disclosed for manufacturing coated substantially plane workpieces, in which the workpieces are guided to a vacuum treatment area guided by a control. The treatment atmosphere is modulated in the treatment area as a function of workpiece position with the defined profile. The system and process can be used to deposit defined layer thickness distribution profiles on substrates in a reactive coating.

Claims (13)

1. A method for manufacturing coated substantially plane workpieces, comprising

guiding the workpieces to a vacuum treatment;

moving the workpieces past a sputtering source on a circular path which is

convex with respect to the sputtering source; and

modulating the sputtering performance of the source as a function of workpiece position so that, whenever a respective workpiece is located centrally facing the sputtering source, the sputtering performance passes through a minimum.

2. The method of claim 1 , wherein said workpiece are coated with a layer of substantially uniform thickness distribution.

3. The method of claim 1 , further comprising controlling said sputtering performance to compensate for a chord effect caused by said plane workpiece being moved on said circular path.

4. A method for manufacturing coated substantially plane workpieces, comprising

guiding the workpieces to a vacuum treatment;

moving the workpieces past a sputtering source on a circular path which is concave with respect to the sputtering source; and

modulating the sputtering performance of the source as a function of workpiece position so that, whenever a respective workpiece is located centrally facing the sputtering source, the sputtering performance passes through a maximum.

5. The method of claim 4 , wherein said workpiece are coated with a layer of substantially uniform thickness distribution.

6. The method of claim 4 , further comprising controlling said sputtering performance to compensate for a chord effect caused by said plane workpiece being moved on said circular path.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 18, 2015
From: OERLIKON SURFACE SOLUTIONS AG, TRUEBBACH
To: EVATEC AG
Reel/Frame 037067/0557 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 15, 2010
From: OC OERLIKON BALZERS AG
To: OERLIKON TRADING AG, TRUBBACH
Reel/Frame 024982/0734 →
CHANGE OF NAME Recorded Dec 22, 2006
From: UNAXIS BALZERS AKTIENGESELLSCHAFT
To: OC OERLIKON BALZERS AG
Reel/Frame 018732/0987 →