Alkali resistant polymeric interlayers for lithoplates
View Patent ↗Substrates for lithographic printing plate precursors and lithographic printing plate precursors are disclosed. The substrates comprise an aluminum or aluminum alloy support and the a layer of interlayer material on the support. The interlayer material is a co-polymer that comprise (1) acid groups and/or phosphonic acid groups, and (2) silyl groups substituted with three alkoxy and/or phenoxy groups. The lithographic printing plate precursors additionally comprise an imageable layer over the interlayer.
1. A substrate comprising, a support and an interlayer on the support, in which:
the support comprises aluminum or an aluminum alloy;
the interlayer comprises an interlayer material;
the interlayer material is a co-polymer comprising K units and L units;
K is selected from —[CH 2 C(R 1 )CO 2 H]—, —[CH 2 CH(PO(OH) 2 )]—, and mixtures thereof;
L is —[CH 2 C(R 2 )(WSi(OR 3 ) 3 )]—;
R 1 is hydrogen, methyl, or a mixture thereof;
R 2 is hydrogen, methyl, or a mixture thereof;
W is a bivalent linking group, a combination of bivalent linking groups, or a mixture of bivalent linking groups; and
each R 3 is independently phenyl, or alkyl of one to six carbon atoms.
2. The substrate of claim 1 in which K is —[CH 2 CH(PO(OH) 2 )]—.
3. The substrate of claim 2 in which W is a carbon-silicon single bond or —CO 2 (CH 2 ) m —, in which m is 2 to 6.
4. The substrate of claim 3 in which each R 3 is methyl or ethyl.
5. The substrate of claim 1 in which K is —[CH 2 C(R 1 )CO 2 H]—.
6. The substrate of claim 5 in which R 1 is hydrogen or methyl; W is a carbon-silicon single bond or —CO 2 (CH 2 ) m —, in which m is 2 to 6; and each R 3 is methyl or ethyl.
7. The substrate of claim 1 in which K is a mixture of —[CH 2 C(R 1 )CO 2 H]— and —[CH 2 CH(PO(OH) 2 )]—.
8. The substrate of claim 7 in which R 1 is hydrogen or methyl; W is a carbon-silicon single bond or —CO 2 (CH 2 ) m —, in which m is 2 to 6; and each R 3 is methyl or ethyl.
9. The substrate of claim 1 additionally comprising an imageable layer over the interlayer.
10. The substrate of claim 9 in which K is —[CH 2 CH(PO(OH) 2 )]—.
11. The substrate of claim 10 in which W is a carbon-silicon single bond or —CO 2 (CH 2 ) m —, in which m is 2 to 6.
12. The substrate of claim 11 in which each R 3 is methyl or ethyl.
13. The substrate of claim 9 in which K is —[CH 2 C(R 1 )CO 2 H]—.
14. The substrate of claim 13 in which R 1 is hydrogen or methyl; W is a carbon-silicon single bond or —CO 2 (CH 2 ) m —, in which m is 2 to 6; and each R 3 is methyl or ethyl.
15. The substrate of claim 9 in which K is a mixture of —[CH 2 C(R 1 )CO 2 H]— and —[CH 2 CH(PO(OH) 2 )]—.
16. The substrate of claim 15 in which R 1 is hydrogen or methyl; W is a carbon-silicon single bond or —CO 2 (CH 2 ) m —, in which m is 2 to 6; and each R 3 is methyl or ethyl.
17. An imageable element comprising an imageable layer over a substrate, in which:
the substrate comprises, a support and an interlayer on the support;
the support comprises aluminum or an aluminum alloy;
the interlayer comprises an interlayer material;
the interlayer material is a co-polymer comprising K units and L units;
K is selected from —[CH 2 C(R 1 )CO 2 H]—, —[CH 2 CH(PO(OH) 2 )]—, and mixtures thereof;
L is —[CH 2 C(R 2 )(WSi(OR 3 ) 3 )]—;
R 1 is hydrogen, methyl, or a mixture thereof;
R 2 is hydrogen, methyl, or a mixture thereof;
W is a bivalent linking group, a combination of bivalent linking groups, or a mixture of bivalent linking groups; and
each R 3 is independently phenyl, or alkyl of one to six carbon atoms.
18. The imageable element of claim 17 in which the imageable layer comprises a polymeric diazo resin, and the imageable layer is on the interlayer.
19. The imageable element of claim 18 in which K is —[CH 2 CH(PO(OH) 2 )]—; W is a carbon-silicon single bond or —CO 2 (CH 2 ) m —, m is 2 to 6; and each R 3 is methyl or ethyl.
20. The imageable element of claim 18 which K is —[CH 2 C(R 1 )CO 2 H]—; R 1 is hydrogen or methyl; W is a carbon-silicon single bond or —CO 2 (CH 2 ) m —, m is 2 to 6; and each R 3 is methyl or ethyl.
21. The imageable element of claim 17 in which the imageable layer comprises negative working imageable composition that comprises a monomer and a free radical generating system.
22. The imageable element of claim 21 in which K is —[CH 2 CH(PO(OH) 2 )]—; W is a carbon-silicon single bond or —CO 2 (CH 2 ) m —, m is 2 to 6; and each R 3 is methyl or ethyl.
23. The imageable element of claim 21 which K is —[CH 2 C(R 1 )CO 2 H]—; R 1 is hydrogen or methyl; W is a carbon-silicon single bond or —CO 2 (CH 2 ) m —, m is 2 to 6; and each R 3 is methyl or ethyl.
24. The imageable element of claim 17 in which the imageable layer comprises phenolic resin and a dissolution inhibitor.
25. The imageable element of claim 24 in which K is —[CH 2 CH(PO(OH) 2 )]—; W is a carbon-silicon single bond or —CO 2 (CH 2 ) m —, m is 2 to 6; and each R 3 is methyl or ethyl.
26. The imageable element of claim 24 which K is —[CH 2 C(R 1 )CO 2 H]—; R 1 is hydrogen or methyl; W is a carbon-silicon single bond or —CO 2 (CH 2 ) m —, m is 2 to 6; and each R 3 is methyl or ethyl.
27. The imageable element of claim 17 in which the element additionally comprises an underlayer between the interlayer and the imageable layer.
28. The imageable element of claim 27 in which K is —[CH 2 CH(PO(OH) 2 )]—; W is a carbon-silicon single bond or —CO 2 (CH 2 ) m —, m is 2 to 6; and each R 3 is methyl or ethyl.
29. The imageable element of claim 27 which K is —[CH 2 C(R 1 )CO 2 H]—; R 1 is hydrogen or methyl; W is a carbon-silicon single bond or —CO 2 (CH 2 ) m —, m is 2 to 6; and each R 3 is methyl or ethyl.
30. A method for forming an image, the method comprising the steps of:
providing an imageable element comprising:
a substrate comprising, in order, a support, and an interlayer, and
an imageable layer over the interlayer;
thermally imaging the imageable element and forming an imaged imageable element comprising imaged regions and complementary unimaged regions in the imageable layer;
developing the imaged imageable element and removing one of the imaged regions and the unimaged regions;
in which:
the substrate comprises, a support and an interlayer on the support;
the support comprises aluminum or an aluminum alloy;
the interlayer comprises an interlayer material;
the interlayer material is a co-polymer comprising K units and L units;
K is selected from —[CH 2 C(R 1 )CO 2 H]—, —[CH 2 CH(PO(OH) 2 )]—, and mixtures thereof;
L is —[CH 2 C(R 2 )(WSi(OR 3 ) 3 )]—;
R 1 is hydrogen, methyl, or a mixture thereof;
R 2 is hydrogen, methyl, or a mixture thereof;
W is a bivalent linking group, a combination of bivalent linking groups, or a mixture of bivalent linking groups; and
each R 3 is independently phenyl, or alkyl of one to six carbon atoms.
31. The method of claim 30 in which K is —[CH 2 CH(PO(OH) 2 )]—; W is a carbon-silicon single bond or —CO 2 (CH 2 ) m —, m is 2 to 6; and each R 3 is methyl or ethyl.
32. The method of claim 30 which K is —[CH 2 C(R 1 )CO 2 H]—; R 1 is hydrogen or methyl; W is a carbon-silicon single bond or —CO 2 (CH 2 ) m —, m is 2 to 6; and each R 3 is methyl or ethyl.