Method of making inlaid color filter arrays
View Patent ↗A method of making a color filter array on a first substrate comprising the steps of: providing at least one transferable colorant layer on a second substrate and positioning such transferable layers in transferable relationship with but spaced a distance from the first substrate; and heating the second substrate sufficiently to simultaneously transfer the colorant materials from the heat transferable colorant layers to the first substrate. An etch process is used to form openings in the first colorant, into which subsequent colorants are deposited.
1. A method of making a color filter array on a first substrate comprising the steps of:
a) coating a resist as an adhesion promoting layer over a first substrate;
b) providing at least one heat transferable colorant layer having heat transferable colorant materials on a second substrate and positioning the second substrate such that the heat transferable colorant layers are in transferable relationship with but spaced apart from the first substrate;
c) heating the second substrate sufficiently to cause substantially all of the heat transferable colorant materials to transfer across the space to the adhesion promoting layer on the first substrate;
d) coating the first colorant layer with a silicon containing material;
e) coating the silicon containing material with a photoresist layer and exposing and developing the photoresist layer to form an array of first openings over selected pixels;
f) etching the silicon containing material, using the photoresist layer as a mask, to form an array of second openings in the layer of silicon containing material;
g) etching the first colorant layer, using the layer of silicon containing material as a mask, to form an array of third openings in the first colorant layer;
h) removing the photoresist layer;
i) providing a second heat transferable colorant layer having heat transferable colorant materials on a third substrate and positioning the third substrate such that the heat transferable colorant layers are in transferable relationship with, but spaced apart from, the first substrate;
j) heating the third substrate sufficiently to cause substantially all of the heat transferable colorant layers to transfer across the space so as to deposit the second colorant layers onto the layer of silicon containing material and into the third openings in the first colorant layers;
k) removing the second colorant layers from non-selected regions leaving the second colorant layers in the third openings in the first colorant layers; and
l) etching to remove the silicon containing material.
2. The method of claim 1 further comprising the step of repeating steps d)–l) one or more times to form color filters of different colors.
3. The method of claim 1 , wherein step (c) includes transferring at pressures ≦0.1 Torr.
4. The method of claim 1 , wherein step (c) includes transferring at a pressure of ≦0.001 Torr and a distance of ≦50 mm.
5. The method of claim 1 , wherein step (c) includes transferring at a pressure of ≦0.0001 Torr and at a distance of about 3 mm to about 15 mm.
6. The method of claim 1 , wherein the colorant material is selected from the group consisting of: phthalocyanines; isoindolinones, benzimidazolones; quinophthalones; quinacridones; perylenes; dioxazines; epindolidiones; perinones; monoazo pigments; isoviolanthrones; indanthrones; imidazobenzimidazolones; pyrazoloquinazolones; diketopyrrolopyrroles; and bisaminoanthrones.
7. The method of claim 1 , wherein the resist of step a) is polymethylglutarimide.
8. The method of claim 1 , wherein the silicon-containing material is a spin-on glass.
9. The method of claim 1 , wherein the etch in step f) is done by wet-etching.
10. The method of claim 1 , wherein the etch in step g) is done by plasma-etching.
11. The method of claim 1 , wherein the second colorant layers are removed by washing in a low molecular weight volatile organic liquid.