Plasma etcher
A plasma etcher is provided, which includes: a chamber; top and bottom plasma electrodes provided top and bottom positions of the chamber; a gas injection pipe connected to the chamber; a plurality of diffusion plates provided between the top plasma electrode and the gate injection pipe; and a power generator supplying a plasma voltage to the top and bottom electrodes, wherein the top plasma electrode has a plurality of primary injection holes and the diffusion plates have a plurality of secondary injection holes.
1 . A plasma etcher comprising:
a chamber;
top and bottom plasma electrodes provided top and bottom positions of the chamber;
a gas injection pipe connected to the chamber;
a plurality of diffusion plates provided between the top plasma electrode and the gate injection pipe; and
a power generator supplying a plasma voltage to the top and bottom electrodes,
wherein the top plasma electrode has a plurality of primary injection holes and the diffusion plates have a plurality of secondary injection holes.
2 . The plasma etcher of claim 1 , wherein the injection holes in the diffusion plates facing each other are alternately arranged.
3 . The plasma etcher of claim 2 , further comprising a temperature controller provided at the diffusion plates.
4 . The plasma etcher of claim 3 , further comprising a secondary diffusing plate provided at an inlet of the gate injection pipe.