IP Library Granted Patent US 7,520,220
Granted Patent B2
US 7,520,220 · App. 10/934,385 · Granted Apr 21, 2009

Cliché unit, printing apparatus, and printing method using the same

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Quick Facts
Patent No.
US 7,520,220
App. No.
10/934,385
Granted
Apr 21, 2009
Kind
B2
Abstract

A printing apparatus of the present invention includes a mother cliché having a plurality of sub-clichés and where a groove for a printing pattern is formed at each of the sub-clichés, a substrate for obtaining panels that correspond to the plurality of sub-clichés, respectively, and a printing means for printing the substrate using the mother cliché.

Claims (32)

1. A cliché unit comprising a mother cliché having a plurality of sub-clichés and being rolled by one roller, wherein each of the sub-clichés have grooves to print a pattern and wherein the plurality of sub-clichés include sub-clichés of a same size and sub-clichés of a different size,

wherein a one-time rotation of the one roller has the same length as the mother cliché in a rotation direction of the one roller,

wherein the sub-clichés are tiled each other to form the mother cliché , and

wherein the mother cliché has a structure that a defect sub-cliché of the sub-clichés is replaced with a new sub-cliché.

2. The cliché unit according to claim 1 , wherein the plurality of sub-clichés has the same size as each of corresponding panels to be manufactured using the cliché unit.

3. A printing apparatus comprising:

a mother cliché having a plurality of sub-clichés and being rolled by one roller, wherein each of the sub-clichés have grooves to print a pattern and wherein the plurality of sub-clichés include sub-clichés of a same size and sub-clichés of a different size;

a substrate on which panels are manufactured that correspond to the plurality of sub-clichés; and

a printing means for printing the substrate using the mother cliché

wherein a one-time rotation of the one roller has the same length as the mother cliché in a rotation direction of the one roller,

wherein the sub-clichés are tiled each other to form the mother cliché, and

wherein the mother cliché has a structure that a defect sub-cliché of the clichés is replaced with a new sub-cliché.

4. The apparatus according to claim 3 , wherein the plurality of sub-c 1 ichés and the panels have the same size.

5. The apparatus according to claim 3 , further comprising:

a doctor blade to fill the grooves on the mother cliché with a resist; and

the roller that transfers the resist onto the substrate.

6. The apparatus according to claim 3 , wherein an etching-object layer is formed on the substrate so that a pattern is formed with the resist on the substrate, and the resist is used as a mask.

7. A printing method using a printing apparatus, comprising the steps of:

forming a mother cliché having a plurality of sub-clichés and being rolled by one roller, wherein each of the sub-clichés have grooves to print a pattern and wherein the plurality of sub-clichés include sub-clichés of a same size and sub-clichés of a different size;

filling grooves of the mother cliché with a resist;

transferring the resist in the grooves onto the roller; and

rolling the roller on a substrate so that the transferred resist is placed on the substrate,

wherein a one-time rotation of the one roller has the same length as the mother cliché in a rotation direction of the one roller,

wherein the sub-clichés are tiled each other to form the mother cliché, and

wherein a defect sub-cliché of the sub-clichés is replaced with a new sub-cliché.

8. The method according to claim 7 , wherein the step of forming the mother cliché includes:

manufacturing a plurality of sub-clichés with grooves corresponding to a printing pattern; and

forming the mother cliché by tiling the plurality of sub-clichés each other.

9. The method according to claim 7 or claim 8 , further including aligning the plurality of sub-clichés before tiling the plurality of sub-clichés.

10. The method according to claim 7 , further including heating the resist formed on the substrate.

11. The method according to claim 7 , wherein an etching-object layer is formed on the substrate.

12. The method according to claim 7 , further including forming a pattern on the substrate that corresponds to the grooves by etching an etching-object layer with the transferred resist formed on the substrate used for a mask.

Assignments (2)
CHANGE OF NAME Recorded Oct 17, 2008
From: LG. PHILIPS LCD CO., LTD.
To: LG DISPLAY CO., LTD.
Reel/Frame 021773/0029 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 2, 2004
From: BAEK, MYOUNG KEE
To: LG.PHILIPS LCD CO., LTD.
Reel/Frame 015775/0327 →