Method and apparatus for multiphoton-absorption exposure wherein exposure condition is changed with depth of convergence position

1. A multiphoton-absorption exposure method for exposing a multiphoton absorption material, comprising the steps of:

(a) changing an exposure condition for exposing said multiphoton absorption material to light so that optical reactions are more likely to occur when the light converges at deeper positions in the multiphoton absorption material; and

(b) applying said light to said multiphoton absorption material so that the light converges at a predetermined convergence position in the multiphoton absorption material under said exposure condition changed in said step (a).

2. A multiphoton-absorption exposure method according to claim 1 , wherein said exposure condition includes at least one of an exposure intensity, an exposure time, and a wavelength of said light.

3. A multiphoton-absorption exposure method according to claim 2 , wherein at least one of said exposure intensity and said exposure time is controlled by modulating said light with a light modulator.

4. A multiphoton-absorption exposure method according to claim 1 , wherein said light is pulsed light emitted from a pulse laser.

5. A multiphoton-absorption exposure method according to claim 1 , wherein said multiphoton absorption material is an ultraviolet-curing resin.

6. A multiphoton-absorption exposure method according to claim 1 , wherein said multiphoton absorption material is three-dimensionally exposed by controlling said convergence position in three directions including a depth direction and two directions which are different from the depth direction.

7. A multiphoton-absorption exposure apparatus for exposing a multiphoton absorption material, comprising:

an exposure-condition control unit which changes an exposure condition for exposing said multiphoton absorption material to light so that optical reactions are more likely to occur when the light converges at deeper positions in the multiphoton absorption material; and

an exposure unit which applies said light to said multiphoton absorption material so that the light converges at a predetermined convergence position under said exposure condition changed by said exposure-condition control unit.

8. A multiphoton-absorption exposure apparatus according to claim 7 , wherein said exposure condition includes at least one of an exposure intensity, an exposure time, and a wavelength of said light.

9. A multiphoton-absorption exposure apparatus according to claim 8 , further comprising a light modulator which modulates said light so as to control at least one of said exposure intensity and said exposure time.

10. A multiphoton-absorption exposure apparatus according to claim 7 , further comprising a pulse laser which emits pulsed light as said light.

11. A multiphoton-absorption exposure apparatus according to claim 7 , further comprising a three-dimensional-exposure control unit which controls said convergence position in three directions including a depth direction and two directions which are different from the depth direction, for realizing three-dimensional exposure of said multiphoton absorption material.

12. A multiphoton-absorption exposure apparatus according to claim 11 , wherein said three-dimensional-exposure control unit includes a three-axis movement table for three-dimensionally moving said multiphoton absorption material with respect to said light.

13. A multiphoton-absorption exposure apparatus according to claim 7 , further comprising a storage unit which stores a table defining exposure conditions for possible values of the depth of said predetermined convergence position, and said exposure-condition control unit determines said exposure condition for exposing said multiphoton absorption material, by referring to said table based on an actual value of the depth of said predetermined convergence position.