Extended optical range reflective system for monitoring motion of a member
View Patent ↗A garment and system includes a monitoring fabric that exhibits a light reflection property and substantially no light transmission property when the fabric is illuminated with light having wavelength(s) in the range of 400 to 2200 nanometers. The amount of useful light reflected by the fabric into an aperture of acceptance defined with respect to an axis extending from the fabric relative to the amount of light lost to the aperture of acceptance detectably changes when the fabric stretches in response to motion, as the motion induced by physiological activity (e.g., heart rate). The system includes at least one radiation source and at least one radiation detector, with the detector disposed in the aperture of acceptance. The source and detector may be attached to the fabric in relative positions such that the reception of incident radiation by the detector is directly affected by a change in the amount of useful light reflected by the fabric into the aperture of acceptance as the fabric stretches in response to motion.
1. A system for monitoring at least one predetermined physiological parameter of a wearer, comprising:
a garment comprising a fabric exhibiting a light reflection property and substantially no light transmission property when the fabric is illuminated with light having wavelength(s) in the range of from about 400 to about 2200 nanometers;
an aperture of acceptance defined with respect to an axis extending from the fabric;
at least one source of radiation having wavelength(s) in the range of from about 400 to about 2200 nanometers to direct radiation onto the fabric;
at least one detector disposed in the aperture of acceptance to detect radiation having wavelength(s) in the range of from about 400 to about 2200 nanometers incident on the detector;
a signal processor for converting a periodically varying signal output from the detector or from a data acquisition unit associated with the detector into a signal representative of a predetermined physiological parameter of the garment wearer; and
a conductive pathway disposed on or in the garment connecting the detector and the signal processor;
wherein the source and detector are associated with the fabric in fixed relative positions with respect to the aperture of acceptance such that reception of incident radiation detected by the detector is directly affected by a change in the amount of useful light reflected by the fabric into the aperture of acceptance as the fabric periodically stretches and recovers from stretch in response to at least one predetermined physiological parameter of the garment wearer.
2. The monitoring system of claim 1 wherein the fabric comprises:
a first plurality of reflective yarns knitted or woven with a second plurality of stretchable yarns, wherein each stretchable yarn is formed as a combination of a covered elastic yarn and a hard yarn.
3. The monitoring system of claim 1 wherein the fabric is detachable from the garment.
4. The monitoring system of claim 1 wherein the fabric is integral with the garment.
5. The monitoring system of claim 1 wherein
the signal processor is mounted on or in the garment.
6. A system for monitoring motion of a structures comprising:
a textile mantle mounted to at least a portion of the structure, at least a portion of the mantle being formed from a fabric exhibiting a light reflection property and substantially no light transmission property when the fabric is illuminated with light having wavelength(s) in the range of from about 400 to about 2200 nanometers,
an aperture of acceptance defined with respect to an axis extending from the fabric;
at least one source of radiation having wavelength(s) in the range from about 400 to about 2200 nanometers;
at least one detector disposed in the aperture of acceptance and responsive to incident radiation having wavelength(s) in the range from about 400 to about 2200 nanometers to produce a signal representative thereof;
a signal processor for converting a periodically varying signal output from the detector or from a data acquisition unit associated with the detector into a signal representative of motion of the portion of the structure; and
a conductive pathway disposed on or in the textile mantle connecting the detector and the signal processor;
wherein the source and detector are associated with the fabric in fixed relative positions such that the reception of incident radiation by the detector is directly affected by a change in the amount of useful light reflected by the fabric into the aperture of acceptance as the fabric periodically stretches and recovers from stretch in response to motion of the portion of the structure.
7. The monitoring system of claim 6 , wherein the source and detector are attached to the fabric.
8. The monitoring system of claim 6 wherein the fabric comprises:
a first plurality of reflective yarns knitted or woven with a second plurality of stretchable yarns, wherein
each stretchable yarn is formed as a combination of a covered elastic yarn and a hard yarn.
9. The system of claim 1 wherein the fabric exhibits the light reflection property when illuminated with light having wavelength(s) in the range from about four hundred (400) nanometers to about eight hundred (800) nanometers;
wherein the source provides radiation having wavelength(s) in the range from about four hundred (400) nanometers to about eight hundred (800) nanometers; and
wherein the detector responds to radiation having wavelength(s) in the range from about four hundred (400) nanometers to about eight hundred (800) nanometers.
10. The monitoring system of claim 6 wherein the fabric exhibits light reflection property when illuminated with light having wavelength(s) in the range from about four hundred (400) nanometers to about eight hundred (800) nanometers;
wherein the source provides radiation having wavelength(s) in the range from about four hundred (400) nanometers to about eight hundred (800) nanometers; and
wherein the detector responds to radiation having wavelength(s) in the range from about four hundred (400) nanometers to about eight hundred (800) nanometers.