Randomized patterns of individual optical elements
View Patent ↗A method of randomizing elements into a random pattern on a surface so the random pattern of elements substantially entirely consumes a region of the surface includes choosing an overlap distance and creating an initial pattern of elements that substantially entirely consumes a region of the surface, wherein neighboring elements overlap by the overlap distance. The method also includes choosing a maximum displacement distance, and displacing the elements by random displacement distances from their positions in the initial pattern, the random displacement distances being less than the maximum displacement distance. Moreover, a signed difference in displacement between two neighboring elements is not greater than the overlap distance. An apparatus including the elements is also disclosed.
1. A method of randomizing elements into a random pattern on a surface so the random pattern of elements substantially entirely consumes a region of the surface, the method comprising:
choosing an overlap distance;
creating an initial pattern of elements that substantially entirely consumes a region of the surface, wherein neighboring elements overlap by the overlap distance;
choosing a maximum displacement distance; and
displacing the elements by random displacement distances from their positions in the initial pattern, the random displacement distances being less than the maximum displacement distance, wherein a signed difference in displacement between two neighboring elements is not greater than the overlap distance.
2. The method of claim 1 , wherein the elements are three-dimensional elements.
3. The method of claim 2 , wherein the elements are optical elements.
4. The method of claim 3 , wherein the random pattern of elements corresponds to a pattern of optical elements of a light redirecting film.
5. The method of claim 1 , comprising patterning a surface of a molding substrate with the random pattern of elements.
6. The method of claim 5 , wherein the molding substrate is a molding cylinder.
7. The method of claim 1 , wherein the initial pattern of elements is an ordered pattern of elements.
8. The method of claim 1 , wherein the random displacement distances are integer multiples of a basic displacement distance.
9. The method of claim 8 , wherein the integer multiple is randomly chosen from the group consisting of −1, 0, and 1.
10. The method of claim 1 , wherein the neighboring elements overlap in two nonparallel directions and the overlap distance in one direction is different from the overlap distance in the other direction.
11. The method of claim 1 , wherein the elements of the pattern have multiple sizes and/or shapes.
12. The method of claim 1 , wherein the random displacements are in the same direction as the overlap.
13. The method of claim 12 , wherein the random displacements are signed displacements chosen between the negative of the maximum displacement distance and the maximum displacement distance.
14. The method of claim 1 , wherein the displacing is in at least one direction.
15. The method of claim 14 , wherein the displacing is carried out in two nonparallel directions.
16. The method of claim 15 , wherein the two nonparallel directions are substantially perpendicular.
17. The method of claim 15 , wherein the maximum displacement distances are different in the two directions.
18. The method of claim 1 , wherein the overlap distance is between approximately 1 percent and approximately 20 percent of the length of each of the elements measured in the direction of the overlap distance.
19. The method of claim 1 , wherein the elements comprise a flat surface and a curved surface.
20. The method of claim 1 , wherein the surface has a length and a width and the length of the surface is approximately 30 times to approximately 1000 times the length of an element.
21. The method of claim 1 , wherein the surface has a length and a width and the width of the surface is approximately 600 times to approximately 20,000 times the width of an element.
22. The method of claim 1 , wherein the maximum displacement distance is no greater than approximately half of the overlap distance.
23. The method of claim 1 , wherein the maximum displacement distance is greater than approximately half of the overlap distance.
24. The method of claim 23 , wherein the random displacement distances are integer multiples of the overlap distance.
25. The method of claim 23 , wherein:
the random pattern is placed adjacent to an identical random pattern; and
the contacting areas of the random pattern and the identical random pattern are substantially invisible.
26. An apparatus, comprising:
a plurality of elements disposed in a substantially random pattern over a surface, the elements covering substantially all of a region of the surface and being disposed at random displacement distances from respective positions in a reference pattern of elements in which neighboring elements overlap by an overlap distance, the displacement distances being less than a maximum displacement distance, and the signed difference in displacement between two of the neighboring elements is not greater than the overlap distance.
27. The apparatus of claim 26 , wherein the elements are three-dimensional elements.
28. The apparatus of claim 27 , wherein the three-dimensional elements are optical elements.
29. The apparatus of claim 28 , wherein the random pattern of elements corresponds to a pattern of optical elements of a light redirecting film.
30. The apparatus of claim 26 , wherein the surface is the surface of a molding substrate.
31. The apparatus of claim 30 , wherein the molding substrate is a molding cylinder.
32. The apparatus of claim 26 , wherein the reference pattern of elements is an ordered pattern of elements.
33. The apparatus of claim 26 , wherein the random displacement distances are integer multiples of a basic displacement distance.
34. The apparatus of claim 33 , wherein the integer multiple is randomly chosen from the group consisting of −1, 0, and 1.
35. The apparatus of claim 26 , wherein the neighboring elements overlap in two nonparallel directions and the overlap distance in one direction is different from the overlap distance in the other direction.
36. The apparatus of claim 26 , wherein the elements of the pattern have multiple sizes and/or shapes.
37. The apparatus of claim 26 , wherein the random displacements are in the same direction as the overlap.
38. The apparatus of claim 37 , wherein the random displacements are signed displacements in the range from the negative of the maximum displacement distance to the maximum displacement distance.
39. The apparatus of claim 26 , wherein the displacements are in at least one direction.
40. The apparatus of claim 39 , wherein the displacements are in two nonparallel directions.
41. The apparatus of claim 40 , wherein the two nonparallel directions are substantially perpendicular.
42. The apparatus of claim 40 , wherein the maximum displacement distances are different in the two directions.
43. The apparatus of claim 26 , wherein the overlap distance is between approximately 1 percent and approximately 20 percent of the length of each of the elements measured in the direction of the overlap distance.
44. The apparatus of claim 26 , wherein the elements comprise a flat surface and a curved surface.
45. The apparatus of claim 26 , wherein the surface has a length and a width and the length of the surface is approximately 30 times to approximately 1000 times the length of an element.
46. The apparatus of claim 26 , wherein the surface has a length and a width and the width of the surface is approximately 600 times to approximately 20,000 times the width of an element.
47. The apparatus of claim 26 , wherein the maximum displacement distance is no greater than approximately half of the overlap distance.
48. The apparatus of claim 26 , wherein the maximum displacement distance is greater than approximately half of the overlap distance.
49. The apparatus of claim 48 , wherein the random displacement distances are integer multiples of the overlap distance.
50. The apparatus of claim 48 , wherein:
the random pattern is placed adjacent to an identical random pattern; and
the contacting areas of the random pattern and the identical random pattern are substantially invisible.