Method for forming plating film
View Patent ↗A method for forming a plating film, comprising the steps of: applying a plating film onto an object to be plated at a first current density for a predetermined period in a plating bath having a cathode capable of varying current and an anode and; and maintaining the object to be plated at a second current density lower than the first current density. According to the present invention, it is possible to improve solderability of a plating film for conventional lead-free solder by a simple method, which allows the productivity to further enhanced, resulting in a plating film with reduced production costs.
1. An electronic component having a plating film formed thereon by a method comprising:
applying a plating film onto an object to be plated at a first current density for a predetermined period in a plating bath having a cathode capable of varying current and an anode and; and
maintaining the object to be plated at a second current density lower than the first current density; and
neutralizing the object to be plated with a trisodium phosphate solution.
2. An electronic component of claim 1 , wherein the plating film is made of an Sn—Cu alloy containing 1 to 5 wt % of Cu.
3. An electronic component of claim 1 , wherein the plating film is a non-glossy plating film of about 8 to 20 μm thick and has particles of an alloy with a 1 μm or less diameter dispersed uniformly therein.
4. An electronic component having a plating film formed thereon by a method comprising:
applying a plating film of an alloy comprising Sn and Cu onto an object to be plated at a first current density for a predetermined period in a plating bath having a cathode and an anode; and
treating for neutralizing the object to be plated with a solution containing 5 to 10% wt of trisodium phosphate.
5. An electronic component of claim 4 , wherein the plating film is made of an Sn—Cu alloy containing 1 to 5 wt % of Cu.
6. An electronic component of claim 4 , wherein the plating film is a non-glossy plating film of about 8 to 20 μm thick and has particles of an alloy with a 1 μm or less diameter dispersed uniformly therein.