Method for fabricating liquid crystal display device
View Patent ↗In etching a metal line formed as a dual layer of aluminum alloy and molybdenum, the metal line consisting of the dual layer of aluminum alloy and molybdenum is etched through one-time wet etching by applying the etchant including HNO 3 , HClO 4 , a Ferric compound (Fe 3+ ), and a Flouro compound (F − ), the process can be reduced and a metal line having a good profile can be formed.
1. A method for forming a metal line, comprising:
forming a metal layer on a substrate, wherein the metal layer comprises an aluminum alloy layer and a molybdenum layer on the aluminum alloy layer; and
etching by one wet etching process the metal layer by applying an etchant including HNO 3 , HClO 4 , a Ferric compound (Fe 3+ ), and a Flouro compound (F − ).
2. The method of claim 1 , further comprising:
forming a photoresist on the metal layer;
exposing the photoresist layer; and
developing the photoresist layer.
3. The method of claim 1 , wherein the Flouro compound is one of NH 4 F, NH 4 HF 2 , HF, NaF, and KF.
4. The method of claim 1 , wherein the Ferric compound is one of Fe(NO 3 ) 3 , FeCl 3 , Fe 2 (SO 4 ) 3 and NH 4 Fe(SO 4 ) 2 .