Gas barrier film and method for producing the same

1. A gas barrier film comprising a resin base material having a glass transition temperature of 250° C. or higher on which there are at least one inorganic layer and at least one organic layer alternately disposed,

wherein the resin has a spiro structure represented by the following formula (1) or a cardo structure represented by the following formula (2):

wherein the rings α represent a monocyclic or polycyclic ring, and two of the rings are bound via a spiro bond,

wherein the ring β and the rings γ represent a monocyclic or polycyclic ring, and two of the rings γ may be identical or different and bond to one quaternary carbon atom in the ring β.

2. The gas baffler film according to claim 1 , wherein the resin has a spiro structure represented by the formula (1).

3. The gas baffler film according to claim 2 , wherein the resin has a spiro structure represented by the following formula (3):

wherein R 31 , R 32 and R 33 each independently represent hydrogen atom or a substituent, groups of each type may bond to each other to form a ring, and m and n represent an integer of 1 to 3.

4. The gas barrier film according to claim 2 , wherein the resin has a spiro structure represented by the following formula (4):

wherein R 41 and R 42 each independently represent hydrogen atom or a substituent, groups of each type may bond to each other to form a ring, and m and n represent an integer of 1 to 3.

5. The gas barrier film according to claim 2 , wherein the resin has a spiro structure represented by the following formula (5):

wherein R 51 and R 52 each independently represent hydrogen atom or a substituent, groups of each type may bond to each other to form a ring, and m and n represent an integer of 1 to 3.

6. The gas barrier film according to claim 1 , wherein the resin has a cardo structure represented by the formula (2).

7. The gas barrier film according to claim 6 , wherein the resin has a cardo structure represented by the following formula (6):

wherein R 61 and R 62 each independently represent hydrogen atom or a substituent, groups of each type may bond to each other to form a ring, and j and k represent an integer of 1 to 4.

8. The gas barrier film according to claim 1 , wherein the resin is a polycarbonate, polyester, polyamide, polyimide or polyurethane having a spiro structure represented by the formula (1) or a cardo structure represented by the formula (2).

9. The gas barrier film according to claim 1 , wherein the resin is an aromatic polyester having a spiro structure represented by the formula (1) or a cardo structure represented by the formula (2).

10. The gas barrier film according to claim 1 , wherein the inorganic layer contains a silicon oxide or a silicon oxynitride.

11. The gas barrier film according to claim 1 , wherein the organic layer contains as a main component a crosslinked polymer compound obtained by polymerization of multifunctional monomers having an acryloyl group or a methacryloyl group.

12. The gas barrier film according to claim 1 , wherein the organic layer is obtained by applying a solution containing a polymer having a hydrogen bond-forming group and a metal alkoxide and drying the solution.

13. The gas barrier film according to claim 1 , which has an oxygen permeability of 0.02 mL/m 2 ·day·atm or lower at 23° C. and 90% of relative humidity, and a water vapor permeability of 0.02 g/m 2 ·day or lower at 23° C. and 100% of relative humidity.

14. An image display device having the gas barrier film according to claim 1 .

15. An organic electroluminescence device having the gas barrier film according to claim 1 .