IP Library Granted Patent US 7,394,478
Granted Patent B2
US 7,394,478 · App. 10/957,675 · Granted Jul 1, 2008

Exposure system

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 7,394,478
App. No.
10/957,675
Granted
Jul 1, 2008
Kind
B2
Abstract

An exposure system is provided with an exposure head formed of a red organic EL element which emits light in a red region and another organic EL element which emits light in a predetermined wavelength range shorter than the red region. The exposure system exposes a color photosensitive body containing therein at least a red silver-salt photosensitive material sensitive to the light in the red region and another silver-salt photosensitive material sensitive to the light in the predetermined wavelength range. An optical filter cuts the wavelength components which are shorter than the predetermined wavelength range and included in a sensitive range of the red silver-salt photosensitive material.

Claims (9)

1. An exposure system which is provided with an exposure head formed of a red organic EL element which emits light in a red region and another organic EL element which emits light in a predetermined wavelength range shorter than the red region and exposes a color photosensitive body containing therein at least a red silver-salt photosensitive material sensitive to the light in the red region and another silver-salt photosensitive material sensitive to the light in the predetermined wavelength range, wherein the improvement comprises that

an optical filter is provided to receive the light emitted from said another organic EL element and to cut the wavelength components which are shorter than the predetermined wavelength range and included in a sensitive range of the red silver-salt photosensitive material,

wherein the optical filter has a high pass filter characteristic,

wherein said another organic EL element is a blue organic EL element which emits light in a blue region and said optical filter cuts the wavelength components shorter than the blue region.

2. An exposure system as defined in claim 1 in which said optical filter is not higher than 30% in transmittance to light in a wavelength range of 360 to 420 nm.

3. An exposure system as defined in claim 1 in which said optical filter is fixedly provided on the exposure head.

4. An exposure system as defined in claim 1 in which a plurality of said red organic EL elements and a plurality of said another organic EL elements are arranged in a main scanning direction to form a linear light emitting element array and a sub-scanning means which moves the exposure head and the color photosensitive body relatively to each other in a direction substantially perpendicular to the main scanning direction.

5. The exposure system of claim 1 , wherein the optical filter is disposed only between the blue organic EL element and the color photosensitive body and no filter is disposed between the red organic EL element and the color photosensitive body.

6. The exposure system of claim 1 , wherein the sensitivity range of the red silver-salt photosensitive material comprises a first portion in the red region and a second portion comprising the wavelength components shorter than the predetermined wavelength range, wherein intensity values of the first portion dominate intensity values of the second portion.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 15, 2007
From: FUJIFILM HOLDINGS CORPORATION (FORMERLY FUJI PHOTO FILM CO., LTD.)
To: FUJIFILM CORPORATION
Reel/Frame 018904/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 5, 2004
From: WADA, MITSUGU
To: FUJI PHOTO FILM CO., LTD.
Reel/Frame 015880/0611 →