Electron beam emitter
View Patent ↗A filament for generating electrons for an electron beam emitter where the filament has a cross section and a length. The cross section of the filament is varied along the length for producing a desired electron generation profile.
1. An electron beam emitter comprising:
a vacuum chamber;
an electron generator positioned within the vacuum chamber for generating electrons, the electron generator including an electron generating filament having a generally round major cross section and a length, the major cross section of the filament being varied a maximum of only a microscopic amount smaller relative to the major cross section along the length for producing a desired electron generation profile along the length; and
an exit window on the vacuum chamber through which the electrons exit the vacuum chamber in an electron beam.
2. The emitter of claim 1 in which at least one portion of the cross section is smaller and provides increased temperature.
3. The emitter of claim 1 in which the filament has at least one major cross sectional area and at least one minor cross sectional area, the major cross sectional area being greater than the minor cross sectional area, the at least one minor cross sectional area for causing increased temperature and electron generation at the at least one minor cross sectional area.
4. The emitter of claim 3 in which the filament has multiple minor cross sectional areas, the minor cross sectional areas being spaced apart from each other at selected intervals.
5. The emitter of claim 3 in which the at least one minor cross sectional area is positioned at one end of the filament to compensate for voltage drop across the length of the filament so that the filament is capable of uniformly generating electrons along the length of the filament.
6. The emitter of claim 3 in which the at least one minor cross sectional area is positioned at opposite ends of the filament for generating a greater amount of electrons at the ends.
7. The emitter of claim 1 in which the filament has varying cross sectional areas along the length.
8. The emitter of claim 7 in which the filament has at least one major diameter and at least one minor diameter, the major diameter being greater than the minor diameter, the at least one minor diameter for causing increased temperature and electron generation at the at least one minor diameter.
9. The emitter of claim 8 in which the filament has multiple minor diameters, the minor diameters being spaced apart from each other at selected intervals.
10. The emitter of claim 8 in which the at least one minor diameter is positioned at one end of the filament to compensate for voltage drop across the length of the filament so that the filament is capable of uniformly generating electrons along the length of the filament.
11. The emitter of claim 8 in which the at least one minor diameter is positioned at opposite ends of the filament for generating a greater amount of electrons at the ends.
12. The emitter of claim 7 in which the filament has varying diameters along the length.
13. A method of forming an electron beam emitter comprising:
providing a vacuum chanter;
positioning an electron generator within the vacuum chamber for generating electrons, the electron generator including an electron generating filament having a generally round major cross section and a length, the major cross section of the filament being varied a maximum of only a microscopic amount smaller relative to the major cross section along the length for producing a desired electron generation profile along the length; and
mounting an exit window on the vacuum chamber through which the electrons exit the vacuum chamber in an electron beam.
14. The method of claim 13 further comprising forming the filament with at least one major cross sectional area and at least one minor cross sectional area, the major cross sectional area being greater than the minor cross sectional area, the at least one minor cross sectional area for causing increased temperature and electron generation at the at least one minor cross sectional area.
15. The method of claim 14 in which the filament has multiple minor cross sectional areas, the method further comprising spacing the minor cross sectional areas apart from each other at selected intervals.
16. The method of claim 14 further comprising positioning the at least one minor cross sectional area at one end of the filament to compensate for voltage drop across the length of the filament so that the filament is capable of uniformly generating electrons along the length of the filament.
17. The method of claim 14 further comprising positioning the at least one minor cross sectional area at opposite ends of the filament for generating a greater amount of electrons at the ends.
18. The method of claim 13 further comprising forming the filament with varying cross sectional areas along the length.
19. The method of claim 18 further comprising forming the filament with varying diameters along the length.
20. The method of claim 19 further comprising forming the filament with at least one major diameter and at least one minor diameter, the major diameter being greater than the minor diameter, the at least one minor diameter for causing increased temperature and electron generation of the filament at the at least one minor diameter.
21. The method of claim 20 in which the filament has multiple minor diameters, the method further comprising spacing the minor diameters apart from each other at selected intervals.
22. The method of claim 20 further comprising positioning the at least one minor diameter at one end of the filament to compensate for voltage drop across the length of the filament so that the filament is capable of uniformly generating electrons along the length of the filament.
23. The method of claim 20 further comprising positioning the at least one minor diameter at opposite ends of the filament for generating a greater amount of electrons at the ends.
24. The method of claim 13 further comprising forming at least one portion of the cross section to be smaller and provide increased temperature.
25. A method of generating electrons with an electron beam emitter comprising:
positioning an electron generator having an electron generating filament within a vacuum chamber;
providing the filament with a generally round major cross section and a length; and
producing a desired electron generation profile along the length of the filament by varying the major cross section of the filament a maximum of only a microscopic amount smaller relative to the major cross section along the length, the electrons exiting the vacuum chamber through an exit window on the vacuum chamber in an electron beam.
26. The method of claim 25 further comprising providing the filament with varying cross sectional areas along the length.
27. The method of claim 26 further comprising providing the filament with at least one major cross sectional area and at least one minor cross sectional area, the major cross sectional area being greater than the minor cross sectional area, the at least one minor cross sectional area for causing increased temperature and electron generation at the at least one minor cross sectional area.
28. The method of claim 27 in which the filament has multiple minor cross sectional areas, the method further comprising spacing the minor cross sectional areas apart from each other at selected intervals.
29. The method of claim 27 further comprising positioning the at least one minor cross sectional area at one end of the filament to compensate for voltage drop across the length of the filament so that the filament is capable of uniformly generating electrons along the length of the filament.
30. The method of claim 27 further comprising positioning the at least one minor cross sectional area at opposite ends of the filament for generating a greater amount of electrons at the ends.
31. The method of claim 26 further comprising providing the filament with varying diameters along the length.
32. The method of claim 31 further comprising providing the filament with at least one major diameter and at least one minor diameter, the major diameter being greater than the minor diameter, the at least one minor diameter for causing increased temperature and electron generation of the filament at the at least one minor diameter.
33. The method of claim 32 in which the filament has multiple minor diameters, the method further comprising spacing the minor diameters apart from each other at selected intervals.
34. The method of claim 32 further comprising positioning the at least one minor diameter at one end of the filament to compensate for voltage drop across the length of the filament so that the filament is capable of uniformly generating electrons along the length of the filament.
35. The method of claim 32 further comprising positioning the at least one minor diameter at opposite ends of the filament for generating a greater amount of electrons at the ends.
36. The method of claim 25 further comprising providing the filament with at least one portion of the cross section to be smaller and provide increased temperature.