IP Library Granted Patent US 7,031,111
Granted Patent B2
US 7,031,111 · App. 10/958,326 · Granted Apr 18, 2006

Ferromagnetic tunnel magnetoresistive devices and magnetic head

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Quick Facts
Patent No.
US 7,031,111
App. No.
10/958,326
Granted
Apr 18, 2006
Kind
B2
Abstract

A ferromagnetic tunnel magnetoresistive film is associated with a high output and whose magnetoresistive ratio is less dependent on a bias voltage. In a three-terminal ferromagnetic tunnel magnetoresistive element, a decrease in an output is suppressed by a bias voltage applied to one of the tunnel junctions. By employing half-metallic ferromagnets in the element, the output can be enhanced and the dependency on the applied bias voltage can be reduced.

Claims (5)

1. A ferromagnetic tunnel magnetoresistive element, comprising: a first ferromagnetic metal layer; a first insulating barrier layer formed on the first ferromagnetic metal layer; a half-metallic ferromagnetic layer formed on the first insulating barrier layer; a second insulating barrier layer formed on the half-metallic ferromagnetic layer; and a second ferromagnetic metal layer formed on the second insulating barrier layer,

wherein the element further comprises a terminal for applying a first bias voltage between the first ferromagnetic metal layer and the second ferromagnetic metal layer, and another terminal for applying a second bias voltage between the half-metallic ferromagnetic layer and the first or second ferromagnetic metal layer.

2. A ferromagnetic tunnel magnetoresistive element according to claim 1 , further comprising a first antiferromagnetic layer under the first ferromagnetic metal layer for fixing the magnetization direction of the first ferromagnetic metal layer, and a second antiferromagnetic layer on the second ferromagnetic metal layer for fixing the magnetization direction of the second ferromagnetic metal layer.

3. A magnetic head provided with a magnetoresistive element comprising: a first ferromagnetic metal layer; a first insulating barrier layer formed on the first ferromagnetic metal layer; a half-metallic ferromagnetic layer formed on the first insulating barrier layer; a second insulating barrier layer formed on the half-metallic ferromagnetic layer; and a second ferromagnetic layer formed on the second insulating barrier layer,

wherein the element further comprises a terminal for applying a first bias voltage between the first ferromagnetic metal layer and the second ferromagnetic metal layer, and another terminal for applying a second bias voltage between the half-metallic ferromagnetic layer and the first or second ferromagnetic metal layer.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 17, 2006
From: HITACHI, LTD.
To: HITACHI GLOBAL STORAGE TECHNOLOGIES JAPAN, LTD.
Reel/Frame 017666/0367 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 1, 2006
From: HITACHI, LTD.
To: HITACHI GLOBAL STORAGE TECHNOLOGIES JAPAN, LTD.
Reel/Frame 017225/0364 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 6, 2004
From: HAYAKAWA, JUN
To: HITACHI, LTD.
Reel/Frame 015873/0183 →