Semiconductor device and system
View Patent ↗Disclosed herewith is a semiconductor device improved to prevent withstand voltage defects that might occur in each MOSFET used therein and a system to be designed easily and prevented from withstand voltage defects that might occur in each semiconductor used therein. The system includes the first and second input circuits, each being constituted by MOSFETs manufactured in the same process. The first input circuit receives a voltage of a first signal inputted from a first external terminal and divided by first and second resistor means while the AC component of the input signal is transmitted to the input circuit through a capacitor disposed in parallel to the first resistor means. The second input circuit receives a second input signal inputted from a second external terminal and reduced in signal amplitude so as to become smaller than that of the first input signal. The system also includes a second semiconductor device corresponding to the first input circuit and a third semiconductor device corresponding to the second input circuit.
1. A semiconductor device, comprising:
first and second resistance elements for dividing a voltage of a first input signal inputted from an external terminal into a voltage-divided first input signal;
first and second capacitors disposed in parallel to said first resistance element;
an input circuit for receiving said voltage-divided first input signal thereby forming an output signal having a smaller amplitude than that of said input signal;
an internal circuit for receiving said output signal from said input circuit; and
an ESD circuit for preventing electrostatic destruction, said ESD circuit being coupled in series at one end to the external terminal, and at the other end to the first resistance element and the first and the second capacitors which are disposed in parallel,
wherein the first input signal has an AC component which is transmitted to the input circuit via the first and second capacitors, and
each of said input circuit and said internal circuit comprises MOSFETs.
2. The semiconductor device according to claim 1 , wherein said voltage divided first input signal is transmitted to said input circuit through a source-drain path of a MOSFET having a gate to which a predetermined voltage is applied.
3. The semiconductor device according to claim 2 , wherein each of said first and second resistance elements is constituted by MOSFETs, and
wherein well portions under gates, sources and drains of the MOSFETs are separated electrically from each other and connected to the sources of the MOSFETs.
4. The semiconductor device according to claim 3 , wherein the first and the second capacitors are constituted by MOSFETs.
5. The semiconductor device according to claim 4 ,
wherein the first capacitor is constituted by a MOSFET whose gate terminal is coupled to an external terminal and whose source terminal and drain terminal are coupled to receive said voltage-divided first input signal, and
wherein the second capacitor is constituted by a MOSFET whose gate terminal is coupled to receive said voltage-divided first input signal and whose source terminal and drain terminal are coupled to the external terminal.
6. The semiconductor device according to claim 5 , wherein the semiconductor device is used as SRAM.
7. The semiconductor device according to claim 5 ,
wherein the semiconductor device is used in a system constituted of a plurality of LSI/ICs each having an input/output interface corresponding to a different input signal voltage from others.