Method for patterning thin film, method and apparatus for fabricating flat panel display
View Patent ↗Disclosed is a method and apparatus for fabricating a patterned thin film layer within a flat panel display that employs a soft mold and heat treatment in place of a photolithographic process. The disclosed method may reduce process time as well as substantially minimize pattern deformities. A method of fabricating a thin film, a method and apparatus of fabricating a flat panel display according to an embodiment of the present invention includes the steps of forming a thin film on a substrate; coating an etch-resist solution including solvent over a substrate where the thin film has been formed; aligning a soft mold on the substrate provided with the etch-resist solution; forming a patterned etch-resist layer on the thin film by forming the etch-resist solution through a first heat treatment below the vaporization temperature of the solvent while pressure is applied to the soft mold on the etch-resist solvent; separating the soft mold from the patterned etch-resist layer; solidifying the patterned etch-resist layer through a second heat treatment; and etching the thin film by using the patterned etch-resist layer as a mask.
1. A method of fabricating a flat panel display, comprising the steps of:
forming an etch-resist solution including a solvent having about 40 wt %-60 wt %;
a cross-linkable polymer resin having about 30 wt %-50 wt %, and
a cross-linker having about 1 wt %-5 wt % forming a thin film on a substrate;
applying the etch-resist solution having a solvent to the substrate;
aligning a soft mold on the substrate;
applying a first heat treatment to the etch-resist solution while applying a pressure to the soft mold on the etch-resist solution, the first heat treatment having a first temperature below a vaporization temperature of the solvent, thereby substantially forming a patterned etch-resist layer;
separating the soft mold from the patterned etch-resist layer;
applying a second heat treatment to the patterned etch-resist layer; and
etching the thin film using the patterned etch-resist layer as a mask, wherein the step of applying a first heat treatment temperature includes the step of applying a temperature of approximately 40° C.-60° C. for about 10 minutes.
2. The fabricating method according to claim 1 , wherein the cross-linkable polymer resin includes phenol-novolac resin.
3. The fabricating method according to claim 1 , wherein the cross-linker includes at least one of an amine family cross linker, a melamine family cross linker and a urea family cross linker.
4. The fabricating method according to claim 1 , wherein the step of applying a second heat treatment includes the step of applying a second temperature approximately equal to or greater than a vaporization temperature of the solvent.
5. The fabricating method according to claim 4 , wherein the step of applying a second heat treatment includes the step of applying a temperature of approximately 70° C.-120° C. for about 2 minutes.
6. The fabricating method according to claim 1 , wherein the step of applying a second heat treatment includes the step of applying a second temperature that is greater than the first temperature.
7. The fabricating method according to claim 6 , wherein the step of applying a second heat treatment includes the step of applying a temperature of approximately 70° C.-120° C. for about 2 minutes.
8. The fabricating method according to claim 1 , wherein the flat panel display is one of a liquid crystal display, a field emission display, a plasma display panel, an electro-luminescence device, and a semiconductor device.
9. A method of patterning a thin film comprising:
forming an etch-resist solution including a solvent having about 40 wt %-60 wt %;
a cross-linkable polymer resin having about 30 wt %-50 wt %, and
a cross-linker having about 1 wt %-5 wt % forming a thin film on a substrate;
applying the etch-resist solution having a solvent to the substrate;
aligning a soft mold on the substrate;
applying a first heat treatment below a vaporization temperature of the solvent while applying a pressure to the soft mold on the etch-resist solvent, thereby substantially forming a patterned etch-resist layer;
separating the soft mold from the patterned etch-resist layer;
solidifying the patterned etch-resist layer; and
etching the thin film using the patterned etch-resist layer as a mask, wherein the step of applying a first heat treatment temperature includes the step of applying a temperature of approximately 40° C.-60° C. for about 10 minutes.
10. The method of claim 9 , wherein the step of solidifying the patterned etch-resist layer includes the step of applying a second heat treatment to the patterned etch-resist layer.
11. The method of claim 10 , wherein the step of applying a second heat treatment includes the step of applying a second temperature of approximately 70° C.-120° C. for about 2 minutes.
12. The fabricating method according to claim 10 , wherein the step of applying a second heat treatment includes the step of applying a second temperature approximately equal to or greater than a vaporization temperature of the solvent.
13. The fabricating method according to claim 9 , wherein the cross-linkable polymer resin includes phenol-novolac resin.
14. The fabricating method according to claim 9 , wherein the cross-linker includes at least one of an amine family cross linker, a melamine family cross linker and a urea family cross linker.
15. A method of fabricating a flat panel display, comprising the steps of:
forming an etch-resist solution including a solvent having about 40 wt %-60 wt %;
a cross-linkable polymer resin having about 30 wt %-50 wt %, and
a cross-linker having about 1 wt %-5 wt % forming a thin film on a substrate;
applying the etch-resist solution having a solvent to the substrate;
aligning a soft mold on the substrate;
applying a first heat treatment to the etch-resist solution while applying a pressure to the soft mold on the etch-resist solution, the first heat treatment having a first temperature below a vaporization temperature of the solvent, thereby substantially forming a patterned etch-resist layer;
separating the soft mold from the patterned etch-resist layer;
applying a second heat treatment to the patterned etch-resist layer;
etching the thin film using the patterned etch-resist layer as a mask;
cleaning the soft mold; and
re-using the soft mold in the patterning of another thin film.