IP Library Granted Patent US 7,081,711
Granted Patent B2
US 7,081,711 · App. 10/974,622 · Granted Jul 25, 2006

Inductively generated streaming plasma ion source

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Quick Facts
Patent No.
US 7,081,711
App. No.
10/974,622
Granted
Jul 25, 2006
Kind
B2
Abstract

A novel pulsed, neutralized ion beam source is provided. The source uses pulsed inductive breakdown of neutral gas, and magnetic acceleration and control of the resulting plasma, to form a beam. The beam supplies ions for applications requiring excellent control of ion species, low remittance, high current density, and spatial uniformity.

Claims (34)

1. A streaming plasma ion source, comprising:

a power supply;

a gas supply positioned upstream of the source;

a set of coils receiving power from the power supply for conveying an energy for ionization of a gas and acceleration of a resultant plasma, and being insulated from the plasma; and

a pre-ionization coil, being a wire coil with a gap in series with a high impedance circuit element for receiving the energy for ionization.

2. The source of claim 1 further comprising a modulator for shaping of the resultant neutralized ion beam pulse, the modulator including a set of coils having electric current flowing therein.

3. The source of claim 1 further comprising a nozzle disposed at the proximity of the set of coils to create a reservoir for the gas subject to ionization.

4. The source of claim 1 further compromising a tank circuit comprising a capacitance positioned in parallel with the inductance of the set of coils for receiving a supply of energy and outputting the same for ionization and acceleration.

5. The source of claim 1 wherein the gas supply comprises a fast needle valve, using a current through a coil generating a pulsed magnetic field that does not fully penetrate a metallic plate connected to a stem thereby controlling the valve.

6. A streaming plasma ion source, comprising:

a power supply;

a gas supply position upstream of the source;

a set of coils receiving power from the power supply for conveying an energy for ionization of a gas and acceleration of the resultant plasma, and being insulated from the plasma; and

a modulator for shaping of the resultant neutralized ion beam pulse, the modulator including a set of coils having electric current flowing therein.

7. The source of claim 6 further comprising a pre-ionization coil, being a wire coil with a gap positioned in series with a high impedance circuit element for receiving the energy for ionization.

8. The source of claim 6 further comprising a nozzle disposed at the proximity of the set of coils to create a reservoir for the gas subject to ionization.

9. The source of claim 6 further comprising a tank circuit comprising a capacitance positioned in parallel with the inductance of the set of coils for receiving a supply of energy and outputting the same for ionization and acceleration.

10. The source of claim 6 wherein the gas supply comprises a fast needle valve, which uses a current through a coil generating a pulsed magnetic field being free from fully penetrating a metallic plate connected to the needle, thereby controlling the valve.

11. A streaming plasma ion source, comprising:

a power supply;

a gas supply position upstream of the source wherein the gas supply comprises a fast needle valve, which uses a current through a coil generating a pulsed magnetic field being free from fully penetrating a metallic plate connected to a stem thereby controlling the valve; and

a set of coils receiving power from the power supply for conveying an energy for ionization of a gas and accelerating a resultant plasma, and being insulated from the plasma.

12. The source of claim 11 further comprising a modulator for shaping of the resultant neutralized ion beam pulse, the modulator including a set of coils having electric current flowing therein.

13. The source of claim 11 further comprising a nozzle disposed at the proximity of the set of coils to create a reservoir for a gas subject to ionization.

14. The source of claim 11 further comprising a tank circuit comprising a capacitance positioned in parallel with an inductance of the set of coils for receiving a supply of energy and outputting the same for ionization and acceleration.

15. The source of claim 11 further comprising a pre-ionization coil, a wire coil with a gap positioned in series with a high impedance circuit element for receiving an energy for ionization.

16. A streaming plasma ion source, comprising:

a power supply;

a gas supply being positioned upstream of the source, wherein the gas supply comprises a fast needle valve, which uses a current through a coil generating a pulsed magnetic field that is free from fully penetrating a metallic plate connected to a stem thereby controlling the valve;

a set of coils receiving power from the power supply for conveying an energy for ionization of a gas and acceleration of the resultant plasma, and being insulated from the plasma;

a modulator for shaping of the resultant neutralized ion beam pulse, the modulator including a set of coils having electric current flowing therein;

a nozzle disposed at the proximity of the set of coils to create a reservoir for a gas subject to ionization;

a tank circuit comprising a capacitance in parallel with the inductance of the set of coils for receiving a supply of energy and outputting the same for ionization and acceleration; and

a pre-ionization coil being a wire coil with a gap positioned in series with a high impedance circuit element for receiving the energy for ionization.

Assignments (5)
PARTIAL RELEASE OF SECURITY INTEREST IN INTELLECTUAL PROPERTY AT R/F 061164/0582 Recorded Feb 13, 2025
From: GOLUB CAPITAL MARKETS LLC, AS AGENT
To: EXCELITAS TECHNOLOGIES CORP.
Reel/Frame 070204/0674 →
SECURITY INTEREST Recorded Aug 12, 2022
From: EXCELITAS TECHNOLOGIES CORP.
To: GOLUB CAPITAL MARKETS LLC, AS COLLATERAL AGENT
Reel/Frame 061164/0582 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 2, 2020
From: SILICON POWER CORPORATION
To: EXCELITAS TECHNOLOGIES CORP.
Reel/Frame 054239/0230 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 30, 2020
From: SILICON PULSED POWER LLC
To: SILICON POWER CORPORATION
Reel/Frame 052534/0325 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 15, 2016
From: APPLIED PULSED POWER, INC.
To: SILICON PULSED POWER LLC
Reel/Frame 040329/0160 →