Granted Patent B1

US 6,944,938 · App. 10/976,504 · Granted Sep 20, 2005

Abstract

Claims (16)

1. A method of forming a read/write head, comprising:

forming on a wafer a write transducer including

forming a first pole layer,

forming a first pole pedestal layer over the first pole layer, the first pole pedestal layer including

a tapered portion defined by

a first end having a nose width less than a desired final nose width, and

a second end having a zero throat width greater than the desired final nose width,

cutting the wafer to produce a slider bar with a cut surface; and

planarizing the cut surface of the slider bar to expose the first pole pedestal layer until a width of the first pole pedestal layer approximately equals the desired final nose width.

2. The method of claim 1 wherein planarizing the cut surface of the slider bar includes lapping.

3. The method of claim 1 wherein forming the write transducer further includes forming a second pole pedestal layer over the first pole pedestal layer, the second pole pedestal layer including a tapered portion.

4. The method of claim 3 wherein planarizing the cut surface of the slider bar further includes exposing the second pole pedestal layer.

5. The method of claim 1 wherein the read/write head is a MR head.

6. The method of claim 1 further comprising forming on the wafer a read transducer.

7. The method of claim 6 wherein the read transducer includes a magnetoresistive element.

8. The method of claim 7 wherein planarizing the cut surface of the slider bar further defines a stripe height of the magnetoresistive element.

Assignments (6)