IP Library Granted Patent US 8,974,599
Granted Patent B2
US 8,974,599 · App. 10/977,267 · Granted Mar 10, 2015

Boron doped single crystal diamond electrochemical synthesis electrode

Inventors: Robert C. Linares (Sherborn, MA); Patrick J. Doering (Holliston, MA)
Assignee: SCIO Diamond Technology Corporation
C30B25/02C30B25/105
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Quick Facts
Patent No.
US 8,974,599
App. No.
10/977,267
Granted
Mar 10, 2015
Kind
B2
Abstract

Synthetic monocrystalline diamond compositions having one or more monocrystalline diamond layers formed by chemical vapor deposition, the layers including one or more layers having an increased concentration of one or more impurities (such as boron and/or isotopes of carbon), as compared to other layers or comparable layers without such impurities. Such compositions provide an improved combination of properties, including color, strength, velocity of sound, electrical conductivity, and control of defects. A related method for preparing such a composition is also described., as well as a system for use in performing such a method, and articles incorporating such a composition.

Claims (29)

1. An electrode comprising:

a CVD boron doped single crystal diamond electrode, the CVD boron doped single crystal diamond free of grain boundaries;

wherein the boron doped single crystal diamond is isotopically enriched with respect to at least one carbon isotope; and

wherein the CVD boron doped single crystal diamond is able to withstand several orders of magnitude higher current than a polycrystalline diamond electrode without catastrophic failure.

2. The electrode of claim 1 having minimal impurities other than boron.

3. The electrode of claim 1 having a life time of use significantly longer than polycrystalline diamond, and wherein the CVD boron doped single crystal diamond is able to withstand several orders of magnitude higher current than polycrystalline diamond without measurable erosion.

4. The electrode of claim 3 wherein the electrode shows substantially uniform wear.

5. The electrode of claim 1 wherein the single crystal diamond has a boron concentration ranging from approximately 0.005 parts per million to 10,000 parts per million.

6. The electrode of claim 1 wherein the single crystal diamond has a boron concentration ranging from approximately 0.05 parts per million to 3,000 parts per million.

7. The electrode of claim 1 having a resistivity of between approximately 100,000 ohm centimeters to approximately 0.01 ohm centimeters.

8. An electrode comprising:

a CVD boron conductively doped single crystal diamond electrode, the CVD conductively doped single crystal diamond substantially free of grain boundaries;

wherein the boron doped single crystal diamond is isotopically enriched with respect to at least one carbon isotope; and

wherein the CVD conductively doped single crystal diamond is able to withstand several orders of magnitude higher current than a polycrystalline diamond electrode without catastrophic failure.

9. The electrode of claim 8 having a life time of use significantly longer than polycrystalline diamond, and wherein the CVD boron doped single crystal diamond is able to withstand several orders of magnitude higher current than polycrystalline diamond without measurable erosion.

10. The electrode of claim 9 wherein the electrode shows substantially uniform wear.

11. The electrode of claim 8 wherein the single crystal diamond is doped with boron having a concentration ranging from approximately 0.005 parts per million to 10,000 parts per million.

12. The electrode of claim 8 wherein the single crystal diamond is doped with boron having a concentration ranging from approximately 0.05 parts per million to 3,000 parts per million.

13. The electrode of claim 8 having a resistivity of between approximately 100,000 ohm centimeters to approximately 0.01 ohm centimeters.

14. An electrode comprising a CVD boron doped single crystal diamond electrode having no grain boundaries, and a life time of use significantly longer than polycrystalline diamond

wherein the boron doped single crystal diamond is isotopically enriched with respect to at least one carbon isotope.

15. The electrode of claim 14 wherein the electrode shows substantially uniform wear, and wherein the CVD boron doped single crystal diamond is able to withstand several orders of magnitude higher current than polycrystalline diamond without measurable erosion.

16. The electrode of claim 14 wherein the single crystal diamond has a boron concentration ranging from approximately 0.005 parts per million to 10,000 parts per million.

17. The electrode of claim 14 wherein the single crystal diamond has a boron concentration ranging from approximately 0.05 parts per million to 3,000 parts per million.

18. The electrode of claim 14 having a resistivity of between approximately 100,000 ohm centimeters to approximately 0.01 ohm centimeters.

19. A device consisting essentially of:

a CVD boron doped single crystal diamond electrode, the CVD boron doped single crystal diamond electrode being free of grain boundaries;

wherein the boron doped diamond is isotopically enriched with respect to at least one carbon isotope; and

wherein the CVD boron doped single crystal diamond is able to withstand several orders of magnitude higher current than a polycrystalline diamond electrode without catastrophic failure as a result of being substantially free of grain boundaries.

Assignments (2)
SECURITY INTEREST Recorded Jan 16, 2015
From: SCIO DIAMOND TECHNOLOGY CORPORATION
To: HERITAGE GEMSTONE INVESTORS, LLC
Reel/Frame 034736/0179 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 4, 2013
From: APOLLO DIAMOND, INC.
To: SCIO DIAMOND TECHNOLOGY CORPORATION
Reel/Frame 030615/0853 →
Continuity (2)
Continuation 10409982 · Apr 8, 2003
Related Publication 20050109262A1 · May 26, 2005