Method of growing single crystal diamond in a plasma reactor
Synthetic monocrystalline diamond compositions having one or more monocrystalline diamond layers formed by chemical vapor deposition, the layers including one or more layers having an increased concentration of one or more impurities (such as boron and/or isotopes of carbon), as compared to other layers or comparable layers without such impurities. Such compositions provide an improved combination of properties, including color, strength, velocity of sound, electrical conductivity, and control of defects. A related method for preparing such a composition is also described, as well as a system for use in performing such a method, and articles incorporating such a composition.
1. A method of growing single crystal diamond, the method comprising:
polishing a CVD grown single crystal seed having a (100) orientation;
placing the seed in a substrate holder in a plasma reactor;
evacuating the reactor to a pressure of less than 10 millitorr;
backfilling the reactor with hydrogen having a purity of at least approximately 99.999%;
providing power to create a plasma ball;
heating the substrate holder to approximately 900° C.;
adding a mixture of methane and hydrogen;
converting part of the hydrogen to atomic hydrogen;
selectively adding nitrogen, wherein the nitrogen is substitutionally incorporated into a growing diamond lattice above a background nitrogen concentration level;
after formation of a desired thickness of single crystal diamond, terminating the flow of methane and hydrogen;
after the end of flow of the methane and hydrogen, terminating the power to extinguish the plasma ball; and
cooling the substrate holder to room temperature.
2. The method of claim 1 wherein the single crystal diamond has a (100) crystal orientation having a first region of substitutional nitrogen adjoining a second region with interstitial nitrogen that is substantially free of substitutional nitrogen.
3. The method of claim 1 wherein the growth rate of diamond is approximately 1 micrometer per hour.
4. The method of claim 1 and further comprising cleaning the single crystal diamond in a mixture of chromic acid and sulfuric acid at a temperature of approximately 250° C.
5. The method of claim 1 wherein hydrogen is backfilled to approximately 40 Torr at a rate of approximately 100 sccm.
6. The method of claim 1 wherein the plasma ball is created in a reactor selected from the group consisting of hot filament reactors, microwave plasma reactors, DC plasma reactors, arc jet reactors, combustion plasma reactors, and RF plasma reactors.
7. The method of claim 1 wherein the methane and hydrogen has a concentration of methane that is approximately 1%.
8. A method of growing single crystal diamond, the method comprising:
polishing a single crystal seed having a (100) orientation;
placing the seed in a substrate holder in a plasma reactor;
filling the reactor with hydrogen having a purity of at least approximately 99.999%;
providing power to create a plasma ball;
heating the substrate holder to approximately 900° C.;
adding methane;
after formation of a desired thickness of single crystal diamond, terminating the flow of methane;
after the end of flow of the methane, terminating the power creating the plasma ball; and
cooling the substrate holder to room temperature.
9. The method of claim 8 wherein the desired thickness of the single crystal diamond is approximately 250 micrometers.
10. The method of claim 8 wherein the single crystal diamond has a (100) crystal orientation.
11. The method of claim 8 wherein the growth rate of diamond is approximately 1 micrometer per hour.
12. The method of claim 8 and further comprising cleaning the single crystal diamond in a mixture of chromic acid and sulfuric acid at a temperature of approximately 250° C.
13. The method of claim 8 wherein the methane and hydrogen has a concentration of methane that is approximately 1%.
14. The method of claim 8 wherein the plasma ball is created in a plasma reactor selected from the group consisting of hot filament, D.C., R.F., microwave, arc jet, and combustion plasma reactors.
15. A method of growing single crystal diamond, the method comprising:
placing a polished seed in a substrate holder in a plasma reactor;
filling the reactor with hydrogen;
providing power to create a plasma ball;
heating the substrate holder to approximately 900° C.;
adding methane;
forming a carbon lattice including substitutional nitrogen atoms with a concentration greater than a background nitrogen concentration, the lattice forming a single crystal diamond;
after formation of a desired thickness of single crystal diamond, terminating the flow of methane;
after the end of flow of the methane, terminating the plasma ball creating power; and
cooling the substrate holder to room temperature.
16. The method of claim 15 wherein the single crystal diamond has a (100) crystal orientation.
17. The method of claim 15 wherein the growth rate of diamond is approximately 1 micrometer per hour.
18. The method of claim 15 and further comprising:
cooling the single crystal diamond; and
cleaning the single crystal diamond in a mixture of chromic acid and sulfuric acid at a temperature of approximately 250° C.
19. The method of claim 15 and further comprising ensuring the presence of atomic hydrogen proximate the single crystal seed.
20. The method of claim 15 wherein the methane and hydrogen has a concentration of methane that is approximately 1%.
21. The method of claim 15 wherein the plasma ball is created in a plasma reactor selected from the group consisting of hot filament, D.C., R.F., microwave, arc jet, and combustion plasma reactors.
22. A method of growing single crystal diamond, the method comprising:
placing a polished seed in a substrate holder in a plasma reactor;
creating a plasma ball in a hydrogen environment;
heating the substrate holder;
adding methane;
flowing a gas containing nitrogen, the flow adjusted in response to an 13 C isotope concentration in the methane;
after formation of a desired thickness of single crystal diamond, terminating the flow of methane;
after the end of flow of the methane, terminating the plasma ball; and
stopping heating the substrate holder.
23. The method of claim 22 wherein the desired thickness of the single crystal diamond is approximately at least 250 micrometers.
24. The method of claim 22 wherein the single crystal diamond has a (100) crystal orientation.
25. The method of claim 22 wherein the growth rate of diamond is approximately 1 micrometer per hour.
26. The method of claim 22 and further comprising:
cooling the single crystal diamond; and
cleaning the single crystal diamond in a mixture of chromic acid and sulfuric acid at a temperature of approximately 250° C.
27. The method of claim 22 wherein the methane and hydrogen has a concentration of methane that is approximately 1%.
28. The method of claim 22 wherein the plasma ball is created in a plasma reactor selected from the group consisting of hot filament, D.C., R.F., microwave, arc jet, and combustion plasma reactors.
29. The method of claim 1 , wherein selectively adding nitrogen during growth includes adding nitrogen to create an optical marker.
30. The method of claim 1 , wherein selectively adding nitrogen includes adding nitrogen to dilate the growing diamond lattice to compensate for an isotropically enhanced 13 C concentration incorporated elsewhere in the growing diamond lattice.
31. The method of claim 1 , wherein selectively adding nitrogen includes adding nitrogen to dilate the growing diamond lattice in response to an isotropically enhanced 13 C concentration incorporated into the growing diamond lattice.
32. A method of growing single crystal diamond, the method comprising:
placing a polished seed in a substrate holder in a plasma reactor; and
forming a single crystal diamond on the polished seed, comprising:
creating a plasma ball in a hydrogen environment;
heating the substrate holder;
adding methane and diborane;
selectively adding nitrogen during formation of the single crystal diamond, wherein nitrogen atoms are substantially incorporated into the lattice of the single crystal diamond with a concentration above a background nitrogen level; and
after formation of a desired thickness of single crystal diamond, terminating the flow of diborane and methane.
33. The method of claim 32 , wherein selectively adding nitrogen includes selectively adding nitrogen to dilate the lattice in a first region including a 13 C concentration of greater than 0.1%.
34. The method of claim 32 , wherein selectively adding includes selectively adding nitrogen to a region of the lattice region forming at least one of a chemical marker and an optical marker within the single crystal diamond.
35. A method of growing single crystal diamond, the method comprising:
placing a polished seed in a substrate holder in a plasma reactor; and
forming a single crystal diamond on the polished seed, comprising:
creating a plasma ball in a hydrogen environment;
heating the substrate holder;
adding methane and diborane;
wherein adding diborane includes selectively adding diborane to a region of the single crystal diamond including an isotropically enhanced 13 C concentration.