Method for eliminating the need for a dedicated landing zone at the outer diameter of a storage system's platter

1. A method for eliminating the need for a dedicated landing zone at an outer diameter of a platter, the method comprising:

positioning a slider at an initial fly height above the platter without requiring the dedicated landing zone at the outer diameter of the platter, wherein the slider is lowered from a ramp to the initial fly height and wherein the ramp is positioned in close proximity to the outer diameter;

moving the slider towards an inner diameter of the platter;

positioning the slider at an intermediate fly height above the platter at some point in time during the moving of the slider towards the inner diameter; and positioning the slider at an operating fly height above the platter when the slider reaches a position relative to the inner diameter of the platter, wherein the intermediate fly height is a height above the platter that is between the initial fly height and the operating fly height and wherein a head associated with the slider operates on the platter; and

wherein the positioning of the slider at the initial fly height that is 400 nm.

2. The method as recited in claim 1 , wherein the positioning the slider at the operating fly height further comprises:

using a velocity associated with the spinning of the platter to cause the slider to be lowered from the initial fly height to the operating fly height.

3. The method as recited in claim 1 , wherein:

the positioning of the slider at the initial fly height further comprises using a force delivered to the slider to control, at least in part, the positioning of the slider at the initial fly height; and

the positioning of the slider at the operating fly height further comprises using the force delivered to the slider to control, at least in part, the positioning of the slider at the operating fly height.

4. The method as recited in claim 3 , wherein the force ranges from approximately 1 gram to 2 grams.

5. The method as recited in claim 1 , wherein:

the positioning of the slider at the initial fly height further comprises using a moment delivered to the slider to control, at least in part, the positioning of the slider at the initial fly height; and

the positioning of the slider at the operating fly height further comprises using the moment delivered to the slider to control, at least in part, the positioning of the slider at the operating fly height.

6. The method as recited in claim 5 , wherein the moment is a product of pitch static attitude (PSA) and pitch stiffness (Kp).

7. The method as recited in claim 6 , wherein the PSA ranges from approximately 0 degrees to 2.5 degrees.

8. The method as recited in claim 7 , wherein the PSA ranges from approximately 1 to 2 degrees.

9. The method as recited in claim 1 , wherein the positioning the slider at the operating fly height further comprises:

lowering ambient pressure around the slider to cause the slider to lower to the operating fly height.

10. The method as recited in claim 1 , wherein:

the positioning of the slider at the initial fly height further comprises using a slider with air bearing properties designed in a manner that controls the positioning of the slider at the initial fly height; and

the positioning of the slider at the operating fly height further comprises using the slider with the air bearing properties designed in a manner that controls the positioning of the slider at the operating fly height.

11. The method as recited in claim 10 , wherein the air bearing properties are determined, at least in part, by a design of the air bearing surface of the slider.

12. The method as recited in claim 1 , wherein operates on the platter is selected from a group consisting of reading data from the platter and writing data to the platter.

13. The method as recited in claim 1 , wherein the positioning the slider at the intermediate fly height further comprises:

positioning the slider at the intermediate fly height that ranges from approximately 60 nanometers (nm) to 200 nm.

14. The method as recited in claim 1 , further comprising:

associating a different dedicated landing zone in close proximity to the inner diameter, wherein the different dedicated landing zone is approximately 1.5 times the width of the slider.

15. The method as recited in claim 14 , wherein the different dedicated landing zone is adjacent to the inner diameter.

16. The method as recited in claim 15 , wherein the positioning the slider at the operating fly height above the platter further comprises:

positioning the slider at the operating fly height at a loading region that is adjacent to the inner diameter.

17. The method as recited in claim 15 , wherein positioning of the slider at the operating fly height at the loading region further comprises:

positioning the slider at the operating fly height at the loading region, wherein the width of the loading region ranges from approximately 50% to 80% the width of the surface of the platter.

18. The method as recited in claim 1 , wherein the positioning of the slider at the operating fly height above the platter further comprises:

positioning the slider at the operating fly height at a loading region that is in close proximity to the inner diameter.