MEMS based charged particle deflector design
View Patent ↗A microcolumn including a plurality of beam modification components coupled to an assembly substrate, wherein the plurality of beam modification components includes: (1) an extractor component; (2) a first focusing electrode component; (3) a first anode component; (4) a first deflector component; (5) a second focusing electrode component; (6) a second deflector component; (7) a third focusing electrode component; (8) a third deflector component; (9) a second anode component; (10) a fourth focusing electrode component; and (11) a third anode component. The beam modification components may be ordered on the substrate in this sequence or other sequences.
1. A microcolumn, comprising:
a plurality of beam modification components coupled to an assembly substrate, the plurality of beam modification components including:
an extractor component;
a first focusing electrode component;
a first anode component;
a first deflector component;
a second focusing electrode component;
a second deflector component;
a third focusing electrode component;
a third deflector component;
a second anode component;
a fourth focusing electrode component; and
a third anode component.
2. The microcolumn of claim 1 wherein:
the first focusing electrode component and the fourth focusing electrode component interpose the extractor component and the third anode component;
the first anode component and the second anode component interpose the first focusing electrode component and the fourth focusing electrode component;
the first deflector component and the third deflector component interpose the first anode component and the fourth anode component;
the second focusing electrode component and the third focusing electrode component interpose the first deflector component and the third deflector component; and
the second deflector component interposes the second focusing electrode component and the third focusing electrode component.
3. The microcolumn of claim 1 wherein the assembly substrate includes a plurality of sockets, and wherein each of the plurality of beam modification components has a connector coupled to a corresponding one of the plurality of sockets.
4. The microcolumn of claim 1 wherein the plurality of beam modification components each have substantially the same thickness.
5. The microcolumn of claim 1 wherein each of the plurality of beam modification components is an integrally formed, substantially planar component.
6. The microcolumn of claim 1 wherein the first, second, and third deflector components are substantially similar.
7. The microcolumn of claim 1 wherein the first, second, and third deflector components each comprise a substantially planar component having a conductive layer divided into a plurality of electrodes collectively surrounding an aperture.
8. The microcolumn of claim 7 wherein the plurality of electrodes includes eight electrodes.
9. The microcolumn of claim 1 wherein the first, second, and third deflector components have substantially similar operating voltage levels.
10. The microcolumn of claim 1 wherein the maximum operating voltage of each of the first, second, and third deflector components is about 25 V.
11. The microcolumn of claim 1 wherein the maximum operating voltage of each of the plurality of beam modification components is about 1 kV.
12. The microcolumn of claim 1 wherein the first and second anode components, the first, second, and third deflector components, and the second and third focusing electrode components are each arranged on the assembly substrate at a substantially constant pitch.
13. The microcolumn of claim 12 wherein the substantially constant pitch is about 500 μm.
14. The microcolumn of claim 1 wherein the first and second anode components, the first, second, and third deflector components, and the second and third focusing electrode components each have an aperture, wherein such apertures are substantially similar in diameter.