Method of fabricating liquid crystal display device with forming gate insulating layer by gas mixtures
View Patent ↗Disclosed is a method of fabricating a liquid crystal display device enabling to form a uniform gate insulating layer in thickness. The present includes the steps of forming a gate line, a gate electrode, and a storage line on a substrate and forming a gate insulating layer on the substrate including the gate line and the gate electrode using first and second gases having a gas mixture ratio of 0.3˜0.5:1. And, the first and second gases are mono-silane (SiH 4 ) and ammonia (NH 3 ), respectively. Accordingly, the present invention enables a uniformly thick gate insulating layer, thereby to improving the discharging time as well as reducing flicker on the screen.
1. A method of fabricating a liquid crystal display device, comprising:
forming a gate line, and a gate electrode on a substrate; and
forming a gate insulating layer on the substrate including the gate line and the gate electrode using first and second gases having a gas mixture ratio of 0.3 to about 0.5:1, said first gas containing mono-silane (SiH 4 ), and said second gas containing ammonia (NH 3 ), said first gas has a flow rate of between 400 sccm and 600 sccm and said second gas has a flow rate of 1,200 sccm such that discharging times are below 5 seconds.
2. The method of claim 1 , wherein the gate insulating layer is formed by plasma enhanced chemical vapor deposition.
3. The method of claim 1 , wherein the gate insulating layer is a silicon nitride layer.
4. The method of claim 1 , further comprising forming a semiconductor layer, a source electrode, and a drain electrode on the gate insulating layer.
5. The method of claim 4 , further comprising forming a passivation layer on the source and drain electrodes.
6. The method of claim 5 , further comprising forming a pixel electrode on the passivation layer to be connected to the drain electrode.
7. The method of claim 1 , wherein said first gas has a flow rate of about 450 sccm.