IP Library Granted Patent US 7,325,907
Granted Patent B2
US 7,325,907 · App. 10/990,789 · Granted Feb 5, 2008

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Quick Facts
Patent No.
US 7,325,907
App. No.
10/990,789
Granted
Feb 5, 2008
Kind
B2
Abstract

Devices used to degas and eject fluid drops are disclosed. Devices include a flow path that includes a pumping chamber in which fluid is pressurized for ejection of a fluid drop, and a semi-permeable membrane including an inorganic material having an outer surface positioned in fluid contact with the flow path. The membrane allows gases to pass therethrough, while preventing liquids from passing therethrough.

Claims (40)

1. A drop ejector system comprising:

a body;

a pumping chamber formed in the body in which fluid is pressurized for ejection of a fluid drop, and

a membrane formed in the body adjacent to the pumping chamber comprising a semi-permeable nitride positioned in fluid contact with a flow path, wherein the membrane has a permeability to He of at least about 1.6×10 −8 mols/(m 2 Pa-s) at room temperature.

2. The drop ejector system of claim 1 , wherein the membrane includes microfractures.

3. The drop ejector of claim 1 , wherein the membrane is porous.

4. The drop ejector system of claim 1 , wherein the membrane includes a first surface in fluid contact with the flow path and a second surface in contact with a vacuum region.

5. The drop ejector system of claim 1 , wherein the membrane is permeable to gas but not to liquid.

6. The drop ejector system of claim 5 , wherein the membrane is permeable to air.

7. The drop ejector system of claim 5 , wherein the membrane is substantially impermeable to ink used in the drop ejector system.

8. The drop ejector system of claim 1 , wherein the nitride comprises a silicon nitride.

9. The drop ejector system of claim 1 , wherein the membrane was exposed to a reactive ion etchant.

10. The drop ejector system of claim 1 , wherein the body comprises a semiconductor material.

11. The drop ejector system of claim 1 , further comprising multiple flow paths.

12. A drop ejector system comprising:

a body;

a pumping chamber formed in the body in which fluid is pressurized for ejection of a fluid drop; and

a membrane formed in the body adjacent to the pumping chamber having a permeability to He of about 1×10 10−10 mols/(m 2 Pa-s) to about 1×10 −6 mols/(m 2 Pa-s) at room temperature positioned in fluid contact with a flow path.

13. The drop ejector system of claim 12 , wherein the membrane includes microfractures.

14. The drop ejector system of claim 12 , wherein the membrane includes a first surface in fluid contact with the flow path and a second surface in contact with a vacuum region.

15. The drop ejector system of claim 12 , wherein the membrane is also permeable to air.

16. The drop ejector system of claim 12 , wherein the membrane is substantially impermeable to liquids.

17. The drop ejector system of claim 16 , wherein the membrane is substantially impermeable to ink used in the drop ejector system.

18. The drop ejector system of claim 12 , wherein the membrane comprises a silicon nitride membrane.

19. The drop ejector system of claim 12 , wherein the membrane was exposed to a reactive ion etchant.

20. The drop ejector system of claim 12 , wherein the membrane has a permeability to He of less than about 1.6×10 −8 mols/(m 2 Pa-s) at room temperature.

21. The drop ejector system of claim 12 , further comprising multiple flow paths.

22. The drop ejector system of claim 12 , wherein the body comprises a semiconductor material.

23. A drop ejector system comprising:

a body;

a pumping chamber formed in the body in which fluid is pressurized for ejection of a fluid drop; and

a membrane formed in the body adjacent to the pumping chamber having fractures that have a cross-sectional dimension no greater than about 100 nm positioned in fluid contact with a flow path, wherein the membrane has a permeability to He of at least about 1.6×10 −8 mols/(m 2 Pa-s) at room temperature.

24. The drop ejector system of claim 23 , wherein the membrane includes a first surface in fluid contact with the flow path and a second surface in contact with a vacuum region.

25. The drop ejector system of claim 23 , wherein the membrane is permeable to gas but not to liquid.

26. The drop ejector system of claim 25 , wherein the membrane is permeable to air.

27. The drop ejector system of claim 26 , wherein the membrane is substantially impermeable to ink used in the drop ejector system.

28. The drop ejector system of claim 23 , wherein the membrane comprises a silicon nitride.

29. The drop ejector system of claim 23 , wherein the membrane was exposed to an reactive ion etchant.

30. The drop ejector system of claim 23 , wherein the body comprises a semiconductor material.

31. The drop ejector system of claim 23 , further comprising multiple flow paths.

Assignments (3)
CHANGE OF NAME Recorded Jan 31, 2007
From: DIMATIX, INC.
To: FUJIFILM DIMATIX, INC.
Reel/Frame 018834/0595 →
CHANGE OF NAME Recorded Jun 20, 2005
From: SPECTRA, INC.
To: DIMATIX, INC.
Reel/Frame 016361/0929 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 27, 2005
From: HOISINGTON, PAUL A.; BATTERTON, JOHN C.; BIBL, ANDREAS; WALSH, BRIAN
To: SPECTRA, INC.
Reel/Frame 016285/0124 →