IP Library Granted Patent US 7,514,725
Granted Patent B2
US 7,514,725 · App. 11/002,850 · Granted Apr 7, 2009

Nanophotovoltaic devices

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Quick Facts
Patent No.
US 7,514,725
App. No.
11/002,850
Granted
Apr 7, 2009
Kind
B2
Abstract

The present invention provides nanophotovoltaic devices having sizes in a range of about 50 nm to about 5 microns, and method of their fabrication. In some embodiments, the nanophotovoltaic device includes a semiconductor core, e.g., formed of silicon, sandwiched between two metallic layers, one of which forms a Schottky barrier junction with the semiconductor core and the other forms an ohmic contact therewith. In other embodiment, the nanophotovoltaic device includes a semiconductor core comprising a p-n junction that is sandwiched between two metallic layers forming ohmic contacts with the core.

Claims (24)

1. An nanophotovoltaic device, comprising

a three-dimensional semi-conductor structure,

a metallic layer disposed over at least a portion of the semiconductor structure to form a junction therewith, said junction defining a space charge region,

wherein a combination of said semi-conductor structure and said metallic layer has a size in each of said three dimensions in a range of about 50 nm to about 5000 nm,

wherein exposure of said nanophotovoltaic device to radiation having a selected wavelength causes generation of electron-hole pairs that provide a voltage across the device.

2. The nanophotovoltaic device of claim 1 , wherein said space charge region supports an electric field that causes separation of said electron-hole pairs to facilitate generation of said voltage.

3. The nanophotovoltaic device of claim 1 , wherein said semiconductor structure comprises a biocompatible semiconductor material.

4. The nanophotovoltaic device of claim 1 , wherein said metallic layer comprises a biocompatible metallic material.

5. The nanophotovoltaic device of claim 1 , wherein said semiconductor comprises any of Si and Ge.

6. The nanophotovoltaic device of claim 1 , wherein said semiconductor is selected from the group consisting of Group II-VI, Group III-V and Group IV semiconductors.

7. The nanophotovoltaic device of claim 1 , wherein said metallic layer comprises a metal selected from the group consisting of gold, silver, platinum, titanium, palladium and alloys thereof.

8. The nanophotovoltaic device of claim 1 , wherein said semiconductor exhibits a direct bandgap and said radiation wavelength corresponds to said bandgap energy.

9. The nanophotovoltaic device of claim 1 , wherein said radiation wavelength is selected to be in range of about 400 nm to about 2000 nm.

10. The nanophotovoltaic device of claim 9 , wherein said radiation wavelength is selected to be in range of about 600 nm to about 1100 nm.

11. The nanophotovoltaic device of claim 1 , further comprising an insulating layer coating at least a portion of said semiconductor structure.

12. The nanophotovoltaic device of claim 11 , wherein said insulating layer has a thickness in a range of about 5 angstroms to about 500 angstroms.

13. The nanophotovoltaic device of claim 11 , wherein said insulating layer comprises an oxide layer.

14. The nanophotovoltaic device of claim 11 , wherein said semiconductor is silicon and said insulating layer comprises SiO 2 .

15. The nanophotovoltaic device of claim 1 , further comprising at least one ligand coupled to a surface of the nanophotovoltaic device.

16. The nanophotovoltaic device of claim 15 , wherein the ligand has an affinity for certain biological cells.

17. A nanophotovoltaic device, comprising

a semiconductor structure,

a metallic layer disposed over at least a portion of the semiconductor structure to form a junction therewith, said junction defining a space charge therein,

wherein said device has a substantially cylindrical shape with a height in a range of about 100 nm to about 1000 nm and a diameter in range of about 100 nm to about 1000 nm.

Assignments (5)
RELEASE OF SECURITY INTEREST Recorded Nov 7, 2018
From: JPMORGAN CHASE BANK, NATIONAL ASSOCIATION
To: MASIMO AMERICAS, INC.; MASIMO CORPORATION
Reel/Frame 047443/0109 →
CORRECTIVE ASSIGNMENT TO CORRECT THE NATURE OF CONVEYANCE PREVIOUSLY RECORDED AT REEL: 032784 FRAME: 0864. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY AGREEMENT. Recorded May 27, 2014
From: MASIMO AMERICAS, INC.; MASIMO CORPORATION
To: JPMORGAN CHASE BANK, NATIONAL ASSOCIATION
Reel/Frame 033032/0426 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 29, 2014
From: MASIMO CORPORATION; MASIMO AMERICAS, INC.
To: JPMORGAN CHASE BANK, NATIONAL ASSOCIATION
Reel/Frame 032784/0864 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 30, 2012
From: SPIRE CORPORATION
To: MASIMO SEMICONDUCTOR, INC.
Reel/Frame 028875/0189 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 7, 2005
From: WOJTCZUK, STEVEN J.; MOE, JAMES G.; LITTLE, ROGER G.
To: SPIRE CORPORATION
Reel/Frame 016747/0053 →