Liquid crystal display device and fabrication method thereof

1. A liquid crystal display device, comprising:

first and second substrates facing each other;

a gate line and a data line arranged substantially perpendicular to one another on the first substrate and defining a pixel region;

a thin film transistor at crossing of the gate line and the data line;

a storage electrode on the gate line;

a passivation film interposed between the thin film transistor and pixel electrode, the passivation film including a passivation film stripe formed on and along the data line, the passivation film stripe being disposed on a portion of a drain electrode of the thin film transistor to expose the upper surface of the storage electrode and other portion of the drain electrode and the pixel region, the exposed other portion of the drain electrode and the exposed pixel region are continuously exposed;

a pixel electrode in the continuously exposed area of the pixel region and the drain electrode and the upper surface of the storage electrode, the pixel electrode being directly in contact with the upper surface of the drain electrode and the whole area of the storage electrode where the passivation film is not disposed; and

liquid crystal interposed between the first and second substrates.

2. The device of claim 1 , wherein the thin film transistor comprises: a gate electrode;

a semiconductor layer on the gate electrode; and source/drain electrodes on the semiconductor layer.

3. The device of claim 1 , further comprising:

a gate insulation layer formed between the gate line and the data line.

4. A method for fabricating a liquid crystal display device, comprising:

providing a first substrate;

forming a gate electrode and a gate line on the substrate;

forming a semiconductor layer pattern on the gate electrode;

forming source/drain electrode and a data line substantially perpendicular to the gate line and crossing to define a pixel region;

forming a passivation film on the substrate having the thin film transistor, the passivation film including a passivation film stripe formed on and along the data line, the passivation film stripe being disposed on a portion of a drain electrode of the thin film transistor to expose the upper surface of the storage electrode and other portion of the drain electrode and the pixel region, the exposed other portion of the drain electrode and the exposed pixel region are continuously exposed; and

forming a pixel electrode in the continuous exposed area of the pixel region and the drain electrode and the upper surface of the storage electrode, the pixel electrode being directly in contact with the upper surface of the drain electrode and the whole area of the storage electrode where the passivation film is not disposed;

providing anther substrate facing the first substrate; and

providing liquid crystal between the first and second substrate.