Organic thin film transistor including organic acceptor film

1. An organic thin film transistor, comprising:

an organic semiconductor film;

source and drain electrodes electrically connected to the organic semiconductor film;

a gate electrode electrically insulated from the source and drain electrodes and the organic semiconductor film; and

an organic acceptor film interposed between the source and drain electrodes, which are disposed on one side of the organic acceptor film, and the organic semiconductor film, which is disposed on another side of the organic acceptor film;

wherein the organic acceptor film comprises a material which forms the organic semiconductor film and a material which forms the organic acceptor film, and

wherein the material which forms the organic acceptor film is 0.1% to 10% by weight.

2. The organic thin film transistor of claim 1 , wherein the organic semiconductor film is formed of pentacene.

3. The organic thin film transistor of claim 1 , further comprising a gate insulating film which electrically insulates the source and drain electrodes from the gate electrode;

wherein the organic acceptor film contacts the source and drain electrodes and the gate insulating film.

4. The organic thin film transistor of claim 3 , further comprising a surface processing film which reinforces adhesion between the gate insulating film and the organic acceptor film.

5. The organic thin film transistor of claim 4 , wherein the surface processing film is formed of any one selected from the group consisting of trichlorosilyl-(—SiCl 3 ), trimethoxysilyl-(—Si(OMe) 3 ), and mercapto-(—SH) moieties.

6. The organic thin film transistor of claim 1 , further comprising a gate insulating film which electrically insulates the source and drain electrodes from the gate electrode;

wherein the organic acceptor film contacts the source and drain electrodes.

7. The organic thin film transistor of claim 6 , further comprising a surface processing film which reinforces adhesion between the gate insulating film and the organic semiconductor film.

8. The organic thin film transistor of claim 7 , wherein the surface processing film is formed of any one selected from the group consisting of trichlorosilyl- (-SiCl 3 S), trimethoxysilyl-(—Si(OMe) 3 ), and mercapto-(—SH) moieties.

9. The organic thin film transistor of claim 1 , wherein the organic acceptor film is formed of at least one electron withdrawing material selected from the group consisting of aromatic compounds, olefine compounds, aromatic-olefine compounds, aromatic-aromatic conjugated compounds, fused aromatic compounds, and hetero cyclic compounds, which contain at least one selected from the group consisting of nitro group (NO 2 ), cyano group (CN), sulfonyl group (SO 2 ), sulfoxide group (SO), carbonyl group (CO), carboxyl group (C 0 2 ), ester group (COO), anhydride, imide, imine, halogen group, fluoroalkyl group, and fluoroaromatic group.

10. The organic thin film transistor of claim 1 , wherein the organic acceptor film is formed of at least one electron withdrawing material selected from the group consisting of 2,4,7-trinitrofluorenone, 4-nitroaniline, 2,4-dinitroaniline, 5-nitroanthranilonitrile, 2,4-dinitrophenylamine, 1,5-dinitronaphthalene, 4-nitrobiphenyl, 9,10-dicyanoanthracene, 3,5-dinitrobenzonitrile, and N,N′-bis(di-t-buytlphenyl)-3,4,9,10-perylenedicarboxyimide.

11. The organic thin film transistor of claim 10 , wherein the organic acceptor film is formed by co-depositing the material which forms the organic semiconductor film and the material which forms the organic acceptor film around the interface between the organic semiconductor film and the source and drain electrodes, and is formed of 0.1 to 10% by weight of the material which forms the organic acceptor film.

12. The organic thin film transistor of claim 1 , wherein the organic acceptor film has a thickness in a range of 1 Å to 100 Å.

13. An organic thin film transistor, comprising:

an organic semiconductor film;

source and drain electrodes electrically connected to the organic semiconductor film;

a gate electrode electrically insulated from the source and drain electrodes and the organic semiconductor film; and

an organic acceptor film interposed between the source and drain electrodes and the organic semiconductor film;

wherein the organic acceptor film is formed of at least one electron withdrawing material selected from the group consisting of olefine compounds and hetero cyclic compounds, which contain at least one selected from the group consisting of nitro group (NO 2 ), cyano group (CN), sulfonyl group (SO 2 ), sulfoxide group (SO), carbonyl group (CO), carboxyl group (CO 2 ), ester group (COO), imide, imine, halogen group and fluoroalkyl group;

wherein the organic acceptor film comprises said at least one electron withdrawing material and a material which forms the organic semiconductor film, and

wherein the electron withdrawing material is 0.1% to 10% by weight.

14. The organic thin film transistor of claim 13 , wherein the organic acceptor film is formed of at least one electron withdrawing material selected from the group consisting of 2,4,7-trinitrofluorenone, 4-nitroaniline, 2,4-dinitroaniline, 5-nitroanthranilonitrile, 2,4-dinitrophenylamine, 1,5-dinitronaphthalene, 4-nitrobiphenyl, 9,10-dicyanoanthracene, 3,5-dinitrobenzonitrile, and N,N′-bis(di-t-buytlphenyl)-3,4,9,10-perylenedicarboxyimide.

15. The organic thin film transistor of claim 13 , wherein the organic acceptor film has a thickness in a range of 1 Å to 100 Å.

16. The organic thin film transistor of claim 13 , further comprising a gate insulating film which electrically insulates the source and drain electrodes from the gate electrode;

wherein the organic acceptor film contacts the source and drain electrodes.

17. The organic thin film transistor of claim 16 , further comprising a surface processing film which reinforces adhesion between the gate insulating film and the organic semiconductor film.

18. The organic thin film transistor of claim 17 , wherein the surface processing film is formed of any one selected from the group consisting of trichiorosilyl-(—SiCl 3 ), trimethoxysilyl-(—Si(OMe) 3 ), and mercapto-(—SH) moieties.