IP Library Granted Patent US 7,085,093
Granted Patent B2
US 7,085,093 · App. 11/013,080 · Granted Aug 1, 2006

Systems and methods for doubling sample rate using two-step self-servowriting

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Quick Facts
Patent No.
US 7,085,093
App. No.
11/013,080
Granted
Aug 1, 2006
Kind
B2
Abstract

A two-step self-servowriting process first writes an intermediate pattern based on a reference pattern, and then writes a final pattern based on the intermediate pattern, wherein the reference pattern can be a printed media or a spiral pattern. Such an approach can be utilized to reduce the noise/runout, eliminate timing eccentricity, and increase the sample rate of the final pattern. This description is not intended to be a complete description of, or limit the scope of, the invention. Other features, aspects, and objects of the invention can be obtained from a review of the specification, the figures, and the claims.

Claims (64)

1. A method for two-step self-servowriting, comprising:

storing one or more patterns on a plurality of servo tracks on a surface of a rotatable medium, wherein the one or more patterns can include at least one of a reference pattern, an intermediate pattern and a final pattern;

positioning a read/write head relative to the surface of the rotatable medium;

writing the intermediate pattern based on the reference pattern via the read/write head; and

writing the final pattern to have higher sample rate than the reference pattern based on the intermediate pattern via the read/write head.

2. The method according to claim 1 , wherein: the reference pattern can be a printed media pattern or a spiral pattern.

3. The method according to claim 1 , wherein:

each of the one or more patterns can include one or more wedges, wherein each of the one or more wedges can include on a servo track in the plurality of servo tracks at least one of an index, a SAM, a zig phase burst, a zag phase burst, and a timing burst.

4. The method according to claim 3 , wherein:

the zig burst and the zag burst can have different phases.

5. The method according to claim 1 , further comprising:

writing the intermediate pattern to be superior to the reference pattern in at least one of the following ways:

a wedge in the intermediate pattern can be smaller in size than a wedge in the reference pattern; and

the intermediate pattern can have one or more of: higher frequency, lower PBS noise, smaller RRO, and more uniformly spaced than the reference pattern.

6. The method according to claim 1 , further comprising:

writing the intermediate pattern to have essentially the same sample rate as the reference pattern.

7. The method according to claim 1 , further comprising:

writing the intermediate pattern to have essentially the same or higher frequency than the final pattern.

8. The method according to claim 1 , further comprising:

writing the intermediate pattern to have essentially the same or lower PES noise than the final pattern.

9. The method according to claim 1 , further comprising:

writing a wedge in the intermediate pattern to have essentially the same size as a wedge in the final pattern.

10. The method according to claim 1 , further comprising:

writing the final pattern to have smaller RRO than the intermediate pattern.

11. The method according to claim 1 , further comprising:

writing the final pattern to have higher number of wedges than the intermediate pattern.

12. The method according to claim 1 , further comprising:

writing the final pattern to have higher sample rate than the intermediate pattern.

13. The method according to claim 1 , further comprising:

writing the final pattern to have higher number of wedges than the reference pattern.

14. The method according to claim 1 , further comprising:

writing the final pattern to double the sample rate of the reference pattern.

15. The method according to claim 1 , further comprising:

performing at least one of the following operations before writing the intermediate pattern:

observing and calculating the WORF and/or PBS information of the reference pattern; and

adjusting the read/write head to reduce the runout.

16. The method according to claim 1 , further comprising:

performing at least one of the following operations before writing the final pattern:

observing and calculating the WORE and/or PES information of the intermediate

pattern; and

adjusting the read/write head to reduce the runout.

17. The method according to claim 1 , further comprising:

erasing a wedge of the reference pattern; and

writing a wedge of the final pattern in place of the wedge of the reference pattern.

18. A system for two-step self-servowriting, comprising:

a rotatable medium including a surface having a plurality of servo tracks operable to store one or more patterns including at least one of a reference pattern, an intermediate pattern and a final pattern;

a read/write head including:

a read element operable to read the one or more patterns; and

a write element operable to write the intermediate and/or the final pattern; and

one or more controllers operable to:

position the read/write head relative to the surface of the rotatable medium;

write the intermediate pattern based on the reference pattern via the read/write

head; and

write the final pattern to have higher sample rate than the reference pattern based

on the intermediate pattern via the read/write head.

19. The system according to claim 18 , wherein:

the rotatable medium can be a magnetic disk, an optical disk, laser-recordable disk, a disk in a single and/or multi-headed disk drive, or a rotatable data storage device.

20. The system according to claim 18 , wherein:

the one or more controllers are further operable to write the final pattern to double the sample rate of the reference pattern.

21. A system for two-step self-servowriting, comprising:

means for storing one or more patterns on a plurality of servo tracks on a surface of a rotatable medium, wherein the one or more patterns can include at least one of a reference pattern, an intermediate pattern and a final pattern;

means for positioning a read/write head relative to the surface of the rotatable medium;

means for writing the intermediate pattern based on the reference pattern via the read/write head; and

means for writing the final pattern to have higher sample rate than the reference pattern based on the intermediate pattern via the read/write head.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 19, 2014
From: PANASONIC HEALTHCARE CO., LTD.
To: PANASONIC CORPORATION
Reel/Frame 032480/0433 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 27, 2014
From: PANASONIC CORPORATION
To: PANASONIC HEALTHCARE CO., LTD.
Reel/Frame 032360/0795 →
CHANGE OF NAME Recorded Feb 25, 2014
From: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
To: PANASONIC CORPORATION
Reel/Frame 032332/0082 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 16, 2005
From: OKI, KENJI
To: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
Reel/Frame 015913/0079 →