Laser mask and crystallization method using the same
View Patent ↗A laser mask includes a mask pattern with edges having inverted shapes to alleviate the effects of diffraction of laser beams to reduce overlap regions such that crystallization characteristics are improved. The laser mask includes a mask pattern that includes transmitting regions and a blocking region. The edges of the mask have shapes inverted to the shapes of the edges of a silicon thin film crystallized by the pattern.
1. A laser mask comprising:
a mask pattern that contains transmitting regions and a blocking region, and the mask pattern has edges having concave shapes inverted in consideration of diffraction of the laser mask and to convex shapes of edges of a silicon thin film crystallized using the laser mask to reduce overlap regions of the crystallized silicon thin film,
wherein the transmitting regions of a slit pattern align such that two transmitting regions are formed on a left side of the laser mask and one transmitting region is formed on a right side of the laser mask to offset each other.
2. The laser mask according to claim 1 , wherein one or more of the transmitting regions transmits laser beams.
3. The laser mask according to claim 2 , wherein a plurality of block-shaped transmitting regions of the mask pattern are formed in the mask.
4. The laser mask according to claim 3 , wherein the block-shaped transmitting regions of the mask pattern are arranged to offset each other.
5. The laser mask according to claim 1 , wherein the blocking region is formed of a metal material that contains aluminum and blocks laser beams.
6. The laser mask according to claim 1 , wherein the concave shapes include a concave triangle, a concave arc, or a concave rectangle.