Method and apparatus for fabricating flat panel display
View Patent ↗This invention relates to a flat panel display and a fabricating method thereof that are adaptive for conducting a patterning process without using a photo process to thereby reduce its process time and minimize pattern defects. A fabricating method and device of a flat panel display according to an embodiment of the present invention spreads an etch-resist on a thin film and forms an etch-resist pattern on a thin film by pressing a soft mold of a permeable structure to the etch-resist.
1. A fabricating method of a flat panel display, comprising:
forming a soft mold as a permeable structure;
spreading an etch-resist over a thin film;
forming an etch-resist pattern on the thin film by pressing the soft mold to the etch-resist;
separating the soft mold from the etch-resist pattern; and
etching the thin film by using the etch-resist pattern as a mask,
wherein, the soft mold is pressed onto the etch resist by its own weight.
2. The fabricating method according to claim 1 , wherein the step of forming the soft mold comprises:
forming the permeable structure using a master mold; and
forming a thin film resin layer on the surface of the permeable structure to stop a solvent flowing into the permeable structure and a rapid gas inflow.
3. The fabricating method according to claim 2 , wherein the permeable structure has silica particles.
4. The fabricating method according to claim 2 , wherein the thin film resin layer has at least one among polydimethylsiloxane, polyurethane and cross-linked novolac resin.
5. The fabricating method according to claim 1 , wherein the thickness of the thin film resin layer is about 1 μm to 100 μm.
6. The fabricating method according to claim 1 , wherein the flat panel display is any one of a liquid crystal display LCD, a field emission display FED, a plasma display panel PDP and an electro luminescence EL.