IP Library Granted Patent US 7,181,972
Granted Patent B2
US 7,181,972 · App. 11/023,202 · Granted Feb 27, 2007

Static and dynamic pressure sensor

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Quick Facts
Patent No.
US 7,181,972
App. No.
11/023,202
Granted
Feb 27, 2007
Kind
B2
Abstract

A sensor, in accordance with aspects of the present technique, is provided. The sensor comprises a membrane formed of gallium nitride. The membrane is disposed on a substrate, which is wet-etched to form a closed cavity. The membrane exhibits both a capacitive response and a piezo-response to an external stimulus. The sensor further includes a circuit for measuring at least one of the capacitive response or the piezo-response. In certain aspects, the sensor may be operable to measure external stimuli, such as, pressure, force and mechanical vibration.

Claims (24)

1. A sensor, comprising:

a membrane formed of gallium nitride;

a sapphire substrate that has been wet-etched to form a cavity, wherein the membrane is disposed on said sapphire substrate and exhibits both a capacitive response and a piezo-response to an external stimulus, wherein the membrane is coupled to and bound by the substrate; and

a circuit for measuring at least one of the capacitive response or the piezo-response.

2. The sensor as recited in claim 1 , wherein the membrane comprises at least one diaphragm.

3. The sensor as recited in claim 1 , wherein the sensor is operable at temperature in excess of about 200 degree Celsius.

4. The sensor as recited in claim 1 , further comprising a substrate formed of silicon carbide.

5. The sensor as recited in claim 1 , wherein the membrane provides a response to pressure.

6. The sensor as recited in claim 1 , wherein the membrane provides a response to force.

7. The sensor as recited in claim 1 , wherein the membrane provides a response to mechanical vibration.

8. A sensor, comprising:

a membrane formed of gallium nitride;

a sapphire substrate that has been wet-etched to form a cavity, wherein said membrane is disposed on said sapphire substrate, wherein said membrane is coupled to and bound by said substrate; and

an optical mechanism configured to measure a deflection of the membrane in response to an external stimulus.

9. The sensor of claim 8 , wherein the membrane comprises at least one diaphragm.

10. The sensor as recited in claim 8 , wherein the sensor is operable at temperature in excess of about 200 degree Celsius.

11. The sensor as recited in claim 8 , further comprising a substrate formed of silicon carbide.

12. The sensor as recited in claim 8 , wherein the external stimulus comprises pressure.

13. The sensor as recited in claim 8 , wherein the external stimulus comprises force.

14. The sensor as recited in claim 8 , wherein the external stimulus comprises mechanical vibration.

15. A pressure sensor comprising a gallium nitride membrane, wherein the pressure sensor is formed by:

etching a sapphire substrate disposed with the gallium nitride membrane to form a cavity, the gallium nitride membrane being coupled to and bound by the sapphire substrate and being operable to respond to at least one of a piezo-response, a capacitive response, an optical interrogation, or an external stimulus; and

coupling a circuit that measures at least one of the piezo-response, the capacitive response, or the optical interrogation.

16. The pressure sensor of claim 15 , wherein etching the substrate disposed with the gallium nitride membrane comprises wet-etching the substrate via cryolite.

Assignments (3)
CHANGE OF NAME Recorded Apr 25, 2014
From: GE THERMOMETRICS, INC.
To: AMPHENOL THERMOMETRICS, INC.
Reel/Frame 032763/0141 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 24, 2014
From: AMPHENOL CORPORATION
To: GE THERMOMETRICS, INC.
Reel/Frame 032745/0924 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 15, 2014
From: GENERAL ELECTRIC COMPANY
To: AMPHENOL CORPORATION
Reel/Frame 032679/0265 →