Method of patterning wall and phosphor well matrix utilizing glass
View Patent ↗A method of fabricating a support structure. In one embodiment, the method is comprised of forming a layer of material into the support structure. The layer of material is adapted to be attached onto a substrate surface. The method further comprises treating the layer of material. The present method is further comprised of etching said layer of material. The fabricated support structure is then implementable during assembly of a display device. In one embodiment, the support structure is attached to the substrate surface prior to the forming, treating, and etching of the layer of material. In another embodiment, the support structure is attached to the substrate surface subsequent to the forming, treating, and etching of the layer of material.
1. A method of fabricating a support structure comprising:
forming a layer of material into said support structure, said layer of material adapted to be attached onto a substrate surface;
blackening a surface of said layer of material, such that said blackened surface of said layer of material is interposed between said layer of material and said substrate surface when said layer of material is attached onto said substrate surface;
treating said layer of material; and
etching said layer of material, such that said support structure is implementable during assembly of a display device, said etching including sandblasting said layer of material with frozen particles of carbon dioxide, such that said substrate surface is unaffected by said sandblasting when said layer of material is attached to said substrate surface prior to said etching, when said layer of material is photochemically insensitive glass.
2. The method as recited in claim 1 wherein said display device is a field emission display.