Photomasks are disclosed. A disclosed example photomask comprises: a first pattern located along an axis of the photomask; at least one second pattern located a distance from and a predetermined angle to the first pattern; and slits made of Cr on at least one end of each of the first and second patterns, wherein the photomask is a Cr-less mask.
1. A photomask comprising:
a first pattern disposed in alignment with a first axis of the photomask;
at least one second pattern disposed at a distance from, and at a predetermined angle to, the first pattern; and
slits made of Cr on at least one end of each of the first and second patterns,
wherein the photomask is a Cr-less mask.
2. A photomask as defined by claim 1 , wherein the slits comprise fine patterns, and each of the fine patterns has a narrower width than a corresponding one of the first and second patterns.
3. A photomask as defined by claim 2 , wherein the fine patterns are aligned parallel to a longitudinal axis of a corresponding one of the first and second patterns.