Media entrance guide in a thermal processor

1. A thermal processor comprising:

an oven for thermally developing an image in a media, the oven including an entrance; and

a guide positioned at the oven entrance, the guide comprising: (a) a receiver having a major surface configured to contact and receive the media, and (b) a separator configured to lift and separate the media from at least a portion of the major surface to direct the media into the oven, wherein the separator is configured to have a temperature above a threshold temperature and the portion of the major surface from which the media is separated is configured to have a temperature not exceeding the threshold temperature.

2. The thermal processor of claim 1 , wherein the threshold temperature is defined by a condensation temperature of gaseous contaminants released by the media during thermal development.

3. The thermal processor of claim 1 , wherein media absorbs thermal energy from the receiver to maintain the portion of the major surface not in contact with the media at the temperature not exceeding the threshold temperature.

4. A thermal processor comprising:

an oven for thermally developing an image in a media the oven including an entrance; and

a guide positioned at the oven entrance, the guide comprising: (a) a receiver having a major surface configured to contact and receive the media, and (b) a separator configured to lift and separate the media from at least a portion of the major surface to direct the media into the oven, wherein the separator comprises a material having low thermal conductivity characteristics.

5. The thermal processor of claim 4 , wherein the separator comprises a plurality of lift elements configured to form a plurality of collection areas which are separated from the media.

6. The thermal processor of claim 5 , wherein the lift elements angularly extend from the major surface of the receiver.

7. The thermal processor of claim 4 , wherein the separator is positioned at least partially with the oven.

8. A thermal processor comprising:

an enclosure including an entrance region;

a heated drum for thermally developing an image in a media positioned within the enclosure; and

a media guide positioned at the entrance region and configured to direct media to the heated drum, the media guide comprising:

a guide plate having a major surface and configured to contact and receive the media along a leading edge positioned external to the enclosure and having a trailing edge positioned at least partially within the enclosure; and

a plurality of lift elements spaced along the trailing edge and configured to separate the media from the guide plate to form a plurality of collection areas along the trailing edge that are not in contact with the media.

9. The thermal processor of claim 8 , wherein the guide plate is configured to have a temperature not exceeding a threshold temperature and the lift elements are configured to have a temperature above the threshold temperature.

10. The thermal processor of claim 9 , wherein the guide plate transfers heat to media at an ambient temperature contacting the guide plate to maintain the guide plate at a temperature below the threshold temperature.

11. The thermal processor of claim 8 , wherein the lift elements extend angularly from the major surface so that the media contacts the heated drum substantially at a desired angle.

12. The thermal processor of claim 8 , wherein the lift elements comprise a material having low thermal conductivity characteristics.

13. A thermal processor comprising:

an oven for thermally developing an image in a media, wherein the media emits gaseous contaminants as the media moves through the oven from an entrance to an exit during development, the gaseous contaminants having a condensation temperature; and

a guide positioned at the oven entrance and configured to direct the media into the oven, the guide comprising:

a major surface configured to receive the media; and

a plurality of lift elements configured to separate the media from at least a portion of the major surface and to form at least one collection zone on the major surface not in contact with the media, the at least one collection zone configured to have a temperature not exceeding the condensation temperature such that the gaseous contaminants condense and collect on the at least one collection zone.

14. A method of operating a thermal processor to remove gaseous contaminants produced during thermal development of an imaging media, the method comprising:

receiving the imaging media via a major surface of an entrance guide;

separating the imaging media from at least a portion of the major surface;

maintaining the entrance guide at a temperature not exceeding a condensation temperature of the gaseous contaminants; and

condensing the gaseous contaminants on the portion of the major surface which is separated from the imaging media.

15. The method of claim 14 , wherein maintaining the entrance guide at a temperature not exceeding the condensation temperature comprises transferring thermal energy from the entrance guide to the imaging media.

16. The method of claim 14 , wherein separating the imaging media from the major surface further comprises separating the imaging media from the major surface such that the imaging media forms a substantially desired angle with the major surface.

17. A thermal processor comprising:

an oven for thermally developing an image in a media wherein the media produces gaseous contaminants during thermal development;

an entrance guide including a major surface configured to receive and direct the media into the oven;

means for separating the media from at least a portion of the major surface; and

means for maintaining the portion of the major surface separated from the media at a temperature not exceeding a condensation temperature of the gaseous contaminants.

18. The thermal processor of claim 17 further comprising:

means for maintaining the means for separating at a temperature above a condensation temperature of the gaseous contaminants.