Semiconductor optical device and manufacturing method thereof
View Patent ↗In a dry etching step for an organic material film, a fluorine-containing member is disposed to the periphery of a semiconductor substrate disposed on a lower electrode or a tray for wafer transportation to form fluorine (fluoro-radicals) from the member per se in addition to the fluoric gas added to the etching gas, with a purpose of removing reaction products, thereby removing reaction products deposited on the semiconductor substrate efficiently and stably.
1. A method of manufacturing a semiconductor optical device comprising the steps of:
forming a ridge waveguide channel with a trench on both sides of the ridge waveguide channel on a semiconductor substrate;
forming a passivation film on the semiconductor substrate containing the ridge waveguide channel and said trench on both sides;
forming an organic material film on the passivation film;
mounting the semiconductor substrate on a lower electrode of a dry etching apparatus, removing the organic material film by planarizing a portion of the organic material film outside of said trench while leaving another portion of the organic material film only within said trench by etching and, simultaneously, removing reaction products deposited on the semiconductor substrate accompanying removal of the organic material film with fluoro-radicals formed in plasmas from a fluorine-containing member disposed to the outer periphery of the substrate mounting surface of the lower electrode;
removing the passivation film in the ridge waveguide channel by dry etching succeeding to the step of removing the organic material film; and
forming an electrode to the region from which the passivation film has been removed.
2. A method of manufacturing a semiconductor optical device according to claim 1 , comprising the steps of:
forming a ridge waveguide channel of an inverted mesa cross sectional shape with a trench on both sides of the ridge waveguide channel on the semiconductor substrate;
forming a passivation film on the semiconductor substrate and forming an organic material film while sandwiching both sides of the inverted mesa cross sectional shape on the passivation film;
mounting the semiconductor substrate on a lower electrode of a dry etching apparatus, by planarizing a portion of the organic material film outside of said trench while leaving another portion of the organic material film only within said trench by etching, and, simultaneously, removing reaction products deposited on the semiconductor substrate accompanying removal of the organic material film by fluoro-radicals formed in plasmas from the fluorine-containing member disposed to the outer periphery of the substrate mounting surface of the lower electrode;
removing the passivation film in the ridge waveguide channel by dry etching succeeding to the removing step for the organic material film and the reaction products; and
forming an upper electrode to be connected with the ridge waveguide channel.
3. A method of manufacturing a semiconductor optical device comprising the steps of:
forming a ridge waveguide channel on a semiconductor substrate;
forming a passivation film on the semiconductor substrate containing the ridge waveguide channel;
forming an organic material film on the passivation film;
mounting the semiconductor substrate on a lower electrode of a dry etching apparatus, removing the organic material film in the portions outside of the trench of the ridge waveguide channel by etching and, simultaneously, removing reaction products deposited on the semiconductor substrate accompanying removal of the organic material film with fluoro-radicals formed in plasmas from a fluorine-containing member disposed to the outer periphery of the substrate mounting surface of the lower electrode;
removing the passivation film in the ridge waveguide channel by dry etching succeeding to the step of removing the organic material film; and
forming an electrode to the region from which the passivation film has been removed,
wherein an oxygen/argon gas mixture is used and a fluoric gas is not used as a main etching gas in the dry etching apparatus used for the step of removing the organic material film and the reaction products.
4. A method of manufacturing a semiconductor optical device comprising the steps of:
forming a ridge waveguide channel on a semiconductor substrate;
forming a passivation film on the semiconductor substrate containing the ridge waveguide channel;
forming an organic material film on the passivation film;
mounting the semiconductor substrate on a lower electrode of a dry etching apparatus, removing the organic material film in the portions outside of the trench of the ridge waveguide channel by etching and, simultaneously, removing reaction products deposited on the semiconductor substrate accompanying removal of the organic material film with fluoro-radicals formed in plasmas from a fluorine-containing member disposed to the outer periphery of the substrate mounting surface of the lower electrode;
removing the passivation film in the ridge waveguide channel by dry etching succeeding to the step of removing the organic material film; and
forming an electrode to the region from which the passivation film has been removed,
wherein the organic material film is formed of a polyimide resin.
5. A method of manufacturing a semiconductor optical device according to claim 1 , wherein a main material for the fluorine-containing member is an organic material.
6. A method of manufacturing a semiconductor optical device comprising the steps of:
forming a ridge waveguide channel on a semiconductor substrate;
forming a passivation film on the semiconductor substrate containing the ridge waveguide channel;
forming an organic material film on the passivation film:
mounting the semiconductor substrate on a lower electrode of a dry etching apparatus, removing the organic material film In the portions outside of the trench of the ridge waveguide channel by etching and, simultaneously, removing reaction products deposited on the semiconductor substrate accompanying removal of the organic material film with fluoro-radicals formed in plasmas from a fluorine-containing member disposed to the outer periphery of the substrate mounting surface of the lower electrode;
removing the passivation film in the ridge waveguide channel by dry etching succeeding to the step of removing the organic material film; and
forming an electrode to the region from which the passivation film has been removed,
wherein a main material for the fluorine-containing member is silicon or SiC.
7. A method of manufacturing a semiconductor optical device comprising the steps of:
forming a ridge waveguide channel on a semiconductor substrate;
forming a passivation film on the semiconductor substrate containing the ridge waveguide channel;
forming an organic material film on the passivation film;
mounting the semiconductor substrate on a lower electrode of a dry etching apparatus, removing the organic material film in the portions outside of the trench of the ridge waveguide channel by etching and, simultaneously, removing reaction products deposited on the semiconductor substrate accompanying removal of the organic material film with fluoro-radicals formed in plasmas from a fluorine-containing member disposed to the outer periphery of the substrate mounting surface of the lower electrode;
removing the passivation film in the ridge waveguide channel by dry etching succeeding to the step of removing the organic material film; and
forming an electrode to the region from which the passivation film has been removed,
wherein the fluorine-containing member is disposed in a ring-shape to the periphery of the substrate mounting surface of the lower electrode.
8. A method of manufacturing a semiconductor optical device comprising the steps of:
forming a ridge waveguide channel on a semiconductor substrate;
forming a passivation film on the semiconductor substrate containing the ridge waveguide channel;
forming an organic material film on the passivation film;
mounting the semiconductor substrate on a lower electrode of a dry etching apparatus, removing the organic material film in the portions outside of the trench of the ridge waveguide channel by etching and, simultaneously, removing reaction products deposited on the semiconductor substrate accompanying removal of the organic material film with fluoro-radicals formed in plasmas from a fluorine-containing member disposed to the outer periphery of the substrate mounting surface of the lower electrode;
removing the passivation film in the ridge waveguide channel by dry etching succeeding to the step of removing the organic material film; and
forming an electrode to the region from which the passivation film has been removed,
wherein a thickness of the fluorine-containing member is larger than the thickness of the semiconductor substrate.
9. A method of manufacturing a semiconductor optical device comprising the steps of:
forming a ridge waveguide channel on a semiconductor substrate;
forming a passivation film on the semiconductor substrate containing the ridge waveguide channel;
forming an organic material film on the passivation film;
mounting the semiconductor substrate on a lower electrode of a dry etching apparatus, removing the organic material film in the portions outside of the trench of the ridge waveguide channel by etching and, simultaneously, removing reaction products deposited on the semiconductor substrate accompanying removal of the organic material film with fluoro-radicals formed in plasmas from a fluorine-containing member disposed to the outer periphery of the substrate mounting surface of the lower electrode;
removing the passivation film In the ridge waveguide channel by dry etching succeeding to the step of removing the organic material film; and
forming an electrode to the region from which the passivation film has been removed,
wherein the lower electrode and fluorine-containing member are integrated.