Photosensitive composition and pattern-forming method using the photosensitive composition
View Patent ↗A photosensitive composition comprises (A) a sulfonium or iodonium salt having an anion represented by one of formulae (I) and (II): wherein Y represents an alkylene group substituted with at least one fluorine atom, and R represents an alkyl group or a cycloalkyl group.
1. A photosensitive composition comprising:
(A) a sulfonium salt represented by formula (I-a) wherein the salt of formula (I-a) is a compound (I-al):
where compound (I-al) is an arylsulfonium compound not including an acid decomposable group as a substituent, and further
where compound (I-al) is an aryldialkylsulfonium compound in which R 201 in formula (I-a) represents an aryl group and R 202 and R 203 each represents an alkyl group, and
wherein the two alkyl groups represented by R 202 and R 203 are bonded with each other to form a ring; and
wherein X − represents an anion represented by formula (I) or (II):
wherein Y represents an alkylene group substituted with at least one fluorine atom, and R represents a cycloalkyl group, or an alkyl group selected from the group consisting of a non-fluorinated alkyl group and a perfluoroalkyl group, said perfluoroalkyl group being selected from the group consisting of a pentafluoroethyl group, a heptafluoropropyl group, a nonafluorobutyl group and a perfluoroethoxyethyl group; and
(B) a fluorine-free resin comprising a repeating unit having a monocyclic or polycyclic hydrocarbon structure and having an alcoholic hydroxyl group, that decomposes by an action of an acid to increase a solubility of the resin in an alkali developer.
2. The photosensitive composition according to claim 1 , wherein the repeating unit is a repeating unit containing at least a structure selected from a monohydroxy adamantane structure, a dihydroxy adamantane structure and a trihydroxy adamantane structure.
3. The photosensitive composition according to claim 1 , wherein the resin (B) comprises at least a methacrylic ester repeating unit and at least an acrylic ester repeating unit.
4. The photosensitive composition according to claim 1 , wherein the resin (B) comprises:
at least one repeating unit selected from 2-alkyl-2-adamantyl (meth)acrylate and dialkyl (1-adamantyl)methyl (meth)acrylate;
at least one repeating unit having a lactone structure; and
at least one repeating unit having two or more hydroxyl groups.
5. The photosensitive composition according to claim 1 , wherein the resin (B) comprises a repeating unit having a carboxyl group.
6. The photosensitive composition according to claim 1 comprising:
(H) a mixed solvent of a solvent containing a hydroxyl group in its structure and a solvent not containing a hydroxyl group in its structure.
7. The photosensitive composition according to claim 1 , further comprising (C) a dissolution-inhibiting compound having a molecular weight of 3,000 or less, the dissolution-inhibiting compound decomposing by an action of an acid to increase a solubility of the dissolution-inhibiting compound in an alkali developer.
8. The photosensitive composition according to claim 1 , further comprising at least one of:
(F) a basic compound; and
(G) at least one surfactant selected from a fluorine surfactant and a silicon surfactant.
9. A pattern-forming method comprising:
forming a photosensitive film with a photosensitive composition according to claim 1 ;
exposing the photosensitive film to form an exposed photosensitive film; and
developing the exposed photosensitive film.
10. The photosensitive composition according to claim 1 , wherein the resin (B) consists essentially of repeating units derived from (meth)acrylic acid or a derivative thereof.
11. The photosensitive composition according to claim 1 , wherein the aryl group represented by R 201 is a phenyl group or a naphthyl group.
12. The photosensitive composition according to claim 1 , wherein the group formed by the bonding of the two alkyl groups represented by R 202 and R 203 is a butylene group or a pentylene group.
13. A photosensitive composition comprising:
(A) a sulfonium salt represented by formula (I-a) wherein the salt of formula (I-a) is a compound (I-al):
where compound (I-al) is an arylsulfonium compound not including an acid decomposable group as a substituent, and further
where compound (I-al) is an aryldialkylsulfonium compound in which R 201 in formula (I-a) represents an aryl group and R 202 and R 203 each represents an alkyl group, and
wherein the two alkyl groups represented by R 202 and R 203 are bonded with each other to form a ring; and
wherein X − represents an anion represented by formula (I) or (II):
wherein Y represents an alkylene group substituted with at least one fluorine atom, and R represents a cycloalkyl group, or an alkyl group selected from the group consisting of a non-fluorinated alkyl group and a perfluoroalkyl group, said perfluoroalkyl group being selected from the group consisting of a pentafluoroethyl group, a heptafluoropropyl group, a nonafluorobutyl group and a perfluoroethoxyethyl group; and
(B) a fluorine-free resin comprising a repeating unit having a monocyclic or polycyclic hydrocarbon structure and having an alcoholic hydroxyl group, that decomposes by an action of an acid to increase a solubility of the resin in an alkali developer, wherein
the fluorine-free resin (B) has a structure represented by formula AI:
wherein R b0 represents a hydrogen atom, a halogen atom, or an alkyl group having from 1 to 4 carbon atoms; A b represents a single bond, an ether group, an ester group, a carbonyl group, an alkylene group, or a divalent linking group combining these groups;
V represents a group represented by any of formulae (V-1) to (V-5) where R 1b , R 2b , R 3b , R 4b and R 5b each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxyl group, an alkoxycarbonyl group, an alkylsulfonyl- imino group or an alkenyl group, and two of R 1b to R 5b may be bonded to form a ring:
14. The photosensitive composition according to claim 13 , wherein the resin (B) comprises at least a methacrylic ester repeating unit and at least an acrylic ester repeating unit.
15. The photosensitive composition according to claim 13 comprising:
(H) a mixed solvent of a solvent containing a hydroxyl group in its structure and a solvent not containing a hydroxyl group in its structure.
16. The photosensitive composition according to claim 13 , further comprising at least one of:
(F) a basic compound; and
(G) at least one surfactant selected from a fluorine surfactant and a silicon surfactant.
17. A pattern-forming method comprising:
forming a photosensitive film with a photosensitive composition according to claim 13 ;
exposing the photosensitive film to form an exposed photosensitive film; and
developing the exposed photosensitive film.
18. The photosensitive composition according to claim 13 , wherein the resin (B) consists essentially of repeating units derived from (meth)acrylic acid or a derivative thereof.
19. The photosensitive composition according to claim 13 , wherein the aryl group represented by R 201 is a phenyl group or a naphthyl group.
20. The photosensitive composition according to claim 13 , wherein the group formed by the bonding of the two alkyl groups represented by R 202 and R 203 is a butylene group or a pentylene group.