Array panel for liquid crystal display device and method of manufacturing the same
View Patent ↗An array panel for a liquid crystal display device includes a substrate, a gate line and a gate electrode on the substrate, wherein the gate line is connected to the gate electrode, a gate insulating layer on the gate line and the gate electrode, an active layer on the gate insulating layer, an ohmic contact layer on the active layer, a data line, a source electrode, and a drain electrode on the ohmic contact layer, wherein the data line, the source electrode, and the drain electrode are formed of molybdenum, a passivation layer on the data line, the source and drain electrodes, and a pixel electrode on the passivation layer, wherein the ohmic contact layer has the same shape as the data line, the source, and drain electrodes, and the active layer has the same shape as the data line, and the source electrode, and the drain electrode except for a channel area between the source electrode and the drain electrode, and the channel area has a “U” shape.
1. An array panel for a liquid crystal display device, comprising:
a substrate;
a gate line, a gate electrode, a first light shielding pattern, and a second light on the substrate, wherein shielding pattern on the substrate, wherein the gate line is connected to the gate electrode;
a gate insulating layer on the gate line and the gate electrode;
an active layer on the gate insulating layer;
an ohmic contact layer on the active layer;
a data line, a source electrode, and a drain electrode on the ohmic contact layer, wherein the data line, the source electrode, and the drain electrode are formed of molybdenum and wherein the first light shielding pattern includes a main body portion parallel to and separated from the data line and projecting portions that project from respective ends of the main body portion to respectively overlap portions of the data line;
a passivation layer on the data line and the source and drain electrodes; and
a pixel electrode on the passivation layer,
wherein the ohmic contact layer has the same shape as the data line, the source electrode, and the drain electrode, wherein the active layer has the same shape as the data line, the source electrode and the drain electrode except for a channel area between the source electrode and the drain electrode, wherein the channel area has a “U” shape, and wherein the first light shielding pattern has an island shape separated from gate line and the second light shielding pattern is connected to the gate line.
2. The panel according to claim 1 , wherein the first light shielding pattern is formed of the same material as the gate line and being parallel to the data line.
3. The panel according to claim 2 , wherein the first light shielding pattern overlaps at least a portion of the pixel electrode.
4. The panel according to claim 2 , wherein the second shielding pattern is parallel to the first shielding pattern.
5. The panel according to claim 4 , wherein the second light shielding pattern overlaps at least a portion of the pixel electrode.
6. The panel according to claim 1 , wherein the drain electrode includes a first part parallel to the gate line and a second part extended from the first part.
7. The panel according to claim 6 , wherein the first part overlaps at least a portion of the pixel electrode.
8. The panel according to claim 6 , wherein the second part has a plurality of protrusions and is exposed by a contact hole.
9. The panel according to claim 1 , wherein the pixel electrode overlaps at least a portion of the gate electrode.
10. The panel according to claim 1 , wherein the “U” shape is substantially completely symmetrical.
11. A method of manufacturing an array panel for a liquid crystal display device, comprising:
forming a gate line, a gate electrode, a first light shielding pattern, and a second light shielding pattern on a substrate;
forming a gate insulating layer on the gate line and the gate electrode;
forming an active layer on the gate insulating layer;
forming ohmic contact layer on the active layer;
forming a data line, a source electrode, and a drain electrode on the ohmic contact layer, wherein the data line, the source electrode, and the drain electrode are formed of molybdenum, and wherein the first light shielding pattern includes a main body portion parallel to and separated from the data line and projecting portions that project from respective ends of the main body portion to respectively overlap portions of the data line;
forming a passivation layer on the data line, the source electrode, and the drain electrode; and
forming a pixel electrode on the passivation layer,
wherein the ohmic contact layer has the same shape as the data line, the source electrode, and the drain electrode, and the active layer has the same shape as the data line, the source electrode and the drain electrode except for a channel area between the source electrode and the drain electrode, wherein the channel area has a “U” shape, and wherein the first light shielding pattern has an island shape separated from gate line and the second light shielding pattern is connected to the gate line.
12. The method according to claim 11 , wherein the first light shielding pattern is formed of the same material as the gate line and parallel to the data line.
13. The method according to claim 11 , wherein the first light shielding pattern overlaps at least a portion of the pixel electrode.
14. The method according to claim 13 , wherein the second shielding pattern is parallel to the first light shielding pattern.
15. The method according to claim 14 , wherein the second light shielding pattern overlaps at least a portion of the pixel electrode.
16. The method according to claim 11 , wherein the drain electrode includes a first part parallel to the gate line and a second part extended from the first part.
17. The method according to claim 16 , wherein the first part of the drain electrode overlaps at least a portion of the pixel electrode.
18. The method according to claim 16 , wherein the second part has a plurality of protrusions and is exposed by a contact hole.
19. The method according to claim 11 , wherein the pixel electrode overlaps at least a portion of the gate electrode.
20. The method according to claim 11 , wherein the “U” shape is substantially completely symmetrical.