Method for manufacturing a magnetic head
View Patent ↗A first magnetic layer is formed on a first magnetic layer formation surface, and then a first material layer-forming layer is deposited on the first magnetic layer formation surface and on the sides and the top of the first magnetic layer and is etched to form first material layers so that the width dimension of each first material layer in the track width direction gradually decreases in the upward direction. Then, a second material layer is formed over the first material layer formation surface, the first material layers, and the first magnetic layer. Then, the first material layers, the second material layer, and the first magnetic layer are polished to expose the upper surface of the first magnetic layer and form the upper surfaces of the second material layer and the first magnetic layer as the same planarized surface.
1. A method for manufacturing a magnetic head comprising a first magnetic layer formed on a first magnetic layer formation surface and having a track width at a surface facing a recording medium, and a second magnetic layer having a width dimension larger than the track width, the first and second magnetic layers being disposed with a space therebetween and directly or indirectly connected together in a rear portion in a height direction, the method comprising the steps of:
(a) forming the first magnetic layer on the first magnetic layer formation surface;
(b) forming a first material layer-forming layer over the first magnetic layer formation surface and the first magnetic layer;
(c) partially removing the first material layer-forming layer so that first material layers are disposed to cover the respective boundaries between a top of the first magnetic layer formation surface and sides of first magnetic layer, and the width dimension of each first material layer in a track width direction gradually decreases in an upward direction;
(d) forming a second material layer over the first magnetic layer formation surface, the first material layers, and the first magnetic layer;
(e) polishing the first and second material layers and the first magnetic layer to expose an upper surface of the first magnetic layer and form upper surfaces of the second material layer and the first magnetic layer as the same planarized surface; and
(f) forming a coil layer above or below the first magnetic layer.
2. The method for manufacturing the magnetic head according to claim 1 , wherein in the step (c), the first material layers are formed in a tapered shape in which the width dimension decreases.
3. The method for manufacturing the magnetic head according to claim 1 , wherein in the step (e), upper surfaces of the first material layers and the first magnetic layer are formed as the same planarized surface.
4. The method for manufacturing the magnetic head according to claim 1 , wherein in the step (e), polishing is finished using the first material layers as a polishing stopper.
5. The method for manufacturing the magnetic head according to claim 1 , wherein in the step (d), the second material layer is formed using a material having a higher polishing rate than that of the first material layers.
6. The method for manufacturing the magnetic head according to claim 5 , wherein the first material layers comprise at least one of SiO 2 , Al—Si—O, Ti, W, and Cr, and the second material layer comprises Al 2 O 3 .
7. The method for manufacturing the magnetic head according to claim 5 , wherein the first material layers comprise at least one of Ti, W, and Cr, and the second material layer comprises one or both of SiO 2 and Al—Si—O.
8. The method for manufacturing the magnetic head according to claim 1 , wherein a third material layer is formed over the first magnetic layer formation surface and the first magnetic layer between the steps (a) and (b), and in the step (b), the first material layer-forming layer is formed over the first magnetic layer formation surface and the first magnetic layer with the third material layer provided therebetween.