IP Library Granted Patent US 7,285,227
Granted Patent B2
US 7,285,227 · App. 11/055,276 · Granted Oct 23, 2007

Method of fabricating printhead to have aligned nozzle guard

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Quick Facts
Patent No.
US 7,285,227
App. No.
11/055,276
Granted
Oct 23, 2007
Kind
B2
Abstract

A method of fabricating a printhead is provided. The printhead includes a substrate, a plurality of nozzles positioned on the substrate and a nozzle guard that is mounted on the substrate to cover the nozzle arrangements. The nozzle guard defines a plurality of apertures that are aligned with respective nozzles so that ink ejected from the nozzles can pass through the apertures and onto a print medium. The method includes the step of depositing sacrificial material on the substrate having the nozzles positioned thereon so that a first portion of the sacrificial material encases the nozzles, positioning the nozzle guard on the substrate so as to contact a second portion of the sacrificial material not encasing the nozzles, and subsequently removing the first portion of the sacrificial material.

Claims (9)

1. A method of fabricating a printhead that includes a substrate, a plurality of nozzles positioned on the substrate and a nozzle guard that is mounted on the substrate to cover the nozzles, the nozzle guard defining a plurality of apertures that are aligned with respective nozzles so that ink ejected from the nozzles can pass through the apertures and onto a print medium, the method including the steps of:

depositing sacrificial material on the substrate having the nozzles positioned thereon so that a first portion of the sacrificial material encases the nozzles;

positioning the nozzle guard on the substrate so as to contact a second portion of the sacrificial material not encasing the nozzles; and subsequently

removing the first portion of the sacrificial material.

2. A method as claimed in claim 1 , wherein the sacrificial material is a polyimide.

3. A method as claimed in claim 2 , wherein the positioning step includes contacting the nozzle guard and the second portion of the polyimide sacrificial material via an inorganic seal.

4. A method as claimed in claim 1 , wherein the positioning step includes positioning support struts of the nozzle guard on alignment formations extending from the substrate formed by the second portion of the sacrificial material.

5. A method as claimed in claim 1 , wherein the removing step includes carrying out a plasma etching process through at least one of the apertures of the nozzle guard.

6. A method as claimed in claim 4 , wherein the plasma etching process is an oxygen plasma etch.

Assignments (3)
CHANGE OF NAME Recorded Jun 25, 2014
From: ZAMTEC LIMITED
To: MEMJET TECHNOLOGY LIMITED
Reel/Frame 033244/0276 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 16, 2012
From: SILVERBROOK RESEARCH PTY. LIMITED AND CLAMATE PTY LIMITED
To: ZAMTEC LIMITED
Reel/Frame 028558/0810 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 10, 2005
From: SILVERBROOK, KIA
To: SILVERBROOK RESEARCH PTY. LTD.
Reel/Frame 016276/0653 →