Metal thin-film resistance element on an insulation film

1. A semiconductor device having a metal thin-film resistance on an insulation film, comprising:

first, second, and third contact holes formed in said insulation film;

a first conductive plug formed in said first contact hole;

a second conductive plug formed in said second contact hole;

a third conductive plug formed in said third contact hole;

a metal thin-film resistance formed on said first and second conductive plugs and on said insulation film; and

a metal interconnection pattern formed on said third conductive plug and said insulation film; and

wherein said first conductive plug comprises a first conductive material formed on an inner wall surface of said first contact hole and a second conductive material formed on said first conductive material in said first contact hole, said second conductive plug comprises said first conductive material formed on an inner wall surface of said second contact hole and said second conductive material formed on said first conductive material in said second contact hole,

a top edge of said first conductive material in said first contact hole is formed with a separation from a top edge of said first contact hole and a top surface of said second conductive material,

an outer peripheral part of said top surface of said second conductive material in said first contact hole and said top edge of said first contact hole forming a tapered surface,

wherein there is formed a buried material in said first contact hole in a space formed on said first conductive material between said inner wall of said first contact hole and said second conductive material in said first contact hole, such that said buried material contains at least a material of said insulation film, said first conductive material and Ar as a component thereof.

2. The semiconductor device as claimed in claim 1 , further comprising a metal nitride film covering a top surface of said metal thin-film resistance, no metal oxide being formed between said top surface of said metal thin-film resistance and said metal nitride film.

3. The semiconductor device as claimed in claim 1 , further comprising a protective insulation film on said metal thin-film resistance.

4. The semiconductor device as claimed in claim 3 , further comprising a metal nitride film between said metal thin-film resistance and said protective insulation film, no metal oxide film being formed between said top surface of said metal thin-film resistance and said metal nitride film.

5. The semiconductor device as claimed in claim 3 , further comprising a metal nitride film as said protective insulation film, no metal oxide film being formed between said top surface of said metal thin-film resistance and said metal nitride film.

6. The semiconductor device as claimed in claim 1 , wherein said metal interconnection pattern constitutes an uppermost metal interconnection pattern of said semiconductor device.

7. The semiconductor device having a voltage divider circuit including two or more resistance elements and producing a divided voltage output, said resistance voltage divider being capable of adjusting said divided voltage output by disconnecting a fuse element, at least one of said resistance elements comprising a metal thin-film resistance formed on an insulation film, comprising:

first, second, and third contact holes formed in said insulation film;

a first conductive plug formed in said first contact hole;

a second conductive plug formed in said second contact hole;

a third conductive plug formed in said third contact hole;

a metal thin-film resistance formed on said first and second conductive plugs and on said insulation film; and

a metal interconnection pattern formed on said third conductive plug and said insulation; and

wherein said first conductive plug comprises a first conductive material formed on an inner wall surface of said first contact hole and a second conductive material formed on said first conductive material in said first contact hole, said second conductive plug comprises said first conductive material formed on an inner wall surface of said second contact hole and said second conductive material formed on said first conductive material in said second contact hole,

a top edge of said first conductive material in said first contact hole is formed with a separation from a top edge of said first contact hole and a top surface of said second conductive material,

an outer peripheral part of said top surface of said second conductive material in said first contact hole and said top edge of said first contact hole forming a tapered surface,

wherein there is formed a buried material in said first contact hole in a space formed on said first conductive material between said inner wall of said first contact hole and said second conductive material in said first contact hole, such that said buried material contains at least a material of said insulation film, said first conductive material and Ar as a component thereof.

8. A semiconductor device having a voltage detector, said voltage detector comprising:

a voltage divider for dividing an input voltage and producing a divided voltage;

a reference voltage generator producing a reference voltage; and

a comparator comparing said divided voltage of said voltage divider and said reference voltage from said reference voltage generator,

said voltage divider including two or more resistance elements for producing divided voltage,

at least one of said resistance elements comprising a metal-thin film resistance formed on an insulation film, comprising:

first, second, and third contact holes formed in said insulation film;

a first conductive plug formed in said first contact hole;

a second conductive plug formed in said second contact hole;

a third conductive plug formed in said third contact hole;

a metal thin-film resistance formed on said first and second conductive plugs and on said insulation film; and

a metal interconnection pattern formed on said third conductive plug and said insulation; and

wherein said first conductive plug comprises a first conductive material formed on an inner wall surface of said first contact hole and a second conductive material formed on said first conductive material in said first contact hole, said second conductive plug comprises said first conductive material formed on an inner wall surface of said second contact hole and said second conductive material formed on said first conductive material in said second contact hole,

a top edge of said first conductive material in said first contact hole is formed with a separation from a top edge of said first contact hole and a top surface of said second conductive material,

an outer peripheral part of said top surface of said second conductive material in said first contact hole and said top edge of said first contact hole forming a tapered surface,

wherein there is formed a buried material in said first contact hole in a space formed on said first conductive material between said inner wall of said first contact hole and said second conductive material in said first contact hole, such that said buried material contains at least a material of said insulation film, said first conductive material and Ar as a component thereof.

9. A semiconductor device having a constant voltage generator, said constant voltage generator comprising:

an output driver supplied with an input voltage and producing an output voltage,

a voltage divider dividing out said output voltage and producing a divided voltage;

a reference voltage generator for producing a reference voltage; and

a comparator comparing said divided voltage of said voltage divider with said reference from said reference voltage generator, said comparator controlling said output driver in response to a result of comparison of said comparator,

said voltage divider including two or more resistance elements, at least one of said resistance elements comprising a metal thin-film resistance formed on an insulation film, comprising:

first, second, and third contact holes formed in said insulation film;

a first conductive plug formed in said first contact hole;

a second conductive plug formed in said second contact hole;

a third conductive plug formed in said third contact hole;

a metal thin-film resistance formed on said first and second conductive plugs and on said insulation film; and

a metal interconnection pattern formed on said third conductive plug and said insulation film; and

wherein said first conductive plug comprises a first conductive material formed on an inner wall surface of said first contact hole and a second conductive material formed on said first conductive material in said first contact hole, said second conductive plug comprises said first conductive material formed on an inner wall surface of said second contact hole and said second conductive material formed on said first conductive material in said second contact hole,

a top edge of said first conductive material in said first contact hole is formed with a separation from a top edge of said first contact hole and a top surface of said second conductive material,

an outer peripheral part of said top surface of said second conductive material in said first contact hole and said top edge of said first contact hole forming a tapered surface,

wherein there is formed a buried material in said first contact hole in a space formed on said first conductive material between said inner wall of said first contact hole and said second conductive material in said first contact hole, such that said buried material contains at least a material of said insulation film, said first conductive material and Ar as a component thereof.