Process for manufacturing a monolithic printhead with truncated cone shape nozzles
View Patent ↗A process for manufacturing a monolithic thermal ink jet printhead ( 40 ) comprising a plurality of chambers ( 74 ) and of nozzles ( 56 ), comprises steps of ( 206 ) depositing a plurality of sacrificial layers ( 31 ), of obtaining, by means of exposure and development operations, a plurality of casts ( 156 ), of ( 215 ) applying a structural layer ( 107 ), and subsequently steps of ( 225 ) removing the casts ( 156 ) and of ( 226 ) removing the sacrificial layers ( 31 ), in order to produce a plurality of chambers ( 74 ) and nozzles ( 56 ).
1. A process of manufacturing a thermal ink jet printhead having a tank suitable for containing ink, comprising the steps of:
providing at least one dice having a substrate including at least one elementary duct and at least one resistor;
applying a sacrificial layer over the at least one elementary duct;
applying a photoresist layer over the sacrificial layer;
exposing the photoresist layer to ultraviolet light under a mask to form at least one cone shaped cast on top of the sacrificial layer;
applying a structural layer over the sacrificial layer and the at least one cone shaped cast;
removing the at least one cone shaped cast and the sacrificial layer to form at least one cone shaped nozzle and a channel connecting the at least one elementary duct to the at least one cone shaped nozzle.
2. The process of claim 1 wherein the photoresist layer is applied on the sacrificial layer by an electrochemical process.
3. The process of claim 2 further comprises etching a groove in said substrate by means of an electrochemical process.
4. The process of claim 3 further comprises applying an electrode, said electrode being a conducting layer forming a single network connected on the inside of the dice.
5. The process of claim 4 wherein the conducting layer connects at least two different dice.
6. The process of claim 1 wherein the sacrificial layer is metal.
7. The process of claim 1 wherein the photoresist layer is applied on the sacrificial layer with a first PDMS mould.
8. The process of claim 7 wherein the photoresist layer is applied on the sacrificial layer by capillarity.
9. The process of claim 1 further comprising applying the structural layer using a second PDMS mould.
10. The process of claim 9 wherein the structural layer is applied by capillarity.
11. The process of claim 1 further comprising applying a second layer of positive photoresist, wherein the second layer of positive photoresist and the structural layer are applied with a PDMS mould.