Optical interconnect structures incorporating sets of diffractive elements
View Patent ↗An optical apparatus comprises an optical interconnect structure defining one or more optical source and receiver ports and one or more interconnect optical signal pathways connecting corresponding optical signal source and receiver ports. The optical interconnect structure comprises an optical waveguide defining a portion of each interconnect optical signal pathway. Each interconnect pathway includes a wavefront diffractive transformation region and a corresponding set of diffractive elements thereof. Each diffractive element set diffractively transforms a corresponding diffracted portion of an incident signal with a corresponding design input signal wavefront into an emergent signal with a corresponding design output signal wavefront. For at least one diffractive element set, only one of the corresponding design input or output signal wavefronts is confined in at least one transverse dimension by the optical waveguide, while the other design wavefront propagates without confinement by the optical waveguide.
1. An optical apparatus, comprising:
an optical interconnect structure defining at least one optical source port, at least one optical receiver port, and at least one interconnect optical signal pathway connecting an optical signal source port and a corresponding optical signal receiver port;
an optical source arranged for launching an optical signal into the optical interconnect structure through the optical source port;
an optical receiver arranged for receiving an optical signal emerging from the optical interconnect structure through the corresponding optical receiver port; and
an electrical circuit joined to the optical interconnect structure, the electrical circuit being operatively coupled to the optical source or the optical receiver,
wherein:
the optical interconnect structure comprises an optical waveguide defining at least a portion of each interconnect optical signal pathway, the optical waveguide substantially confining in at least one transverse dimension optical signals propagating in two dimensions therein;
each interconnect optical signal pathway includes at least one signal wavefront diffractive transformation region and a corresponding set of diffractive elements thereof;
each diffractive element set is arranged for diffractively transforming a corresponding diffracted portion of a signal incident on the wavefront diffractive transformation region with a corresponding design input signal wavefront into a signal emergent from the diffractive transformation region with a corresponding design output signal wavefront;
for at least one diffractive element set, only one of the corresponding design input signal wavefront or the corresponding design output signal wavefront is substantially confined in at least one transverse dimension by the optical waveguide, while another one of the corresponding design input signal wavefront or the corresponding design output signal wavefront propagates without substantial confinement by the optical waveguide;
the optical interconnect structure and the electrical circuit comprise layers formed on at least one substrate; and
(i) the optical interconnect structure is between the electrical circuit and the substrate, (ii) the electrical circuit is between the optical interconnect structure and the substrate, (iii) the optical source or the optical receiver is integrally formed in the electrical circuit layer, or (iv) the optical interconnect structure comprises at least one layer formed on an interconnect substrate and the electrical circuit comprises at least one layer formed on an electrical circuit substrate.
2. The apparatus of claim 1 , wherein the optical interconnect structure and the electrical circuit comprise layers formed on a substrate, and the optical interconnect structure is between the electrical circuit and the substrate.
3. The apparatus of claim 1 , wherein the optical interconnect structure and the electrical circuit comprise layers formed on a substrate, and the electrical circuit is between the optical interconnect structure and the substrate.
4. The apparatus of claim 1 , wherein the optical interconnect structure and the electrical circuit comprise layers formed on a substrate, and the optical source or the optical receiver is integrally formed in the electrical circuit layer.
5. The apparatus of claim 1 , wherein:
the optical interconnect structure and the electrical circuit comprise layers formed on a semiconductor substrate;
the optical interconnect structure is between the electrical circuit and the substrate, or the electrical circuit is between the optical interconnect structure and the substrate;
the optical interconnect structure comprises at least one dielectric layer; and
the electrical circuit comprises at least one semiconductor layer.
6. The apparatus of claim 5 , wherein the substrate comprises silicon or doped silicon, the electrical circuit comprises silicon or doped silicon or metal, and the optical interconnect structure comprises silica or doped silica.
7. The apparatus of claim 1 , wherein the optical interconnect structure comprises at least one layer formed on an interconnect substrate, and the electrical circuit comprises at least one layer formed on an electrical circuit substrate.
8. A method for forming an optical apparatus comprising:
formulating a simulated design input optical signal propagating into a wavefront diffractive transformation region with a design input signal wavefront;
formulating a simulated design output optical signal propagating from the wavefront diffractive transformation region with a design output signal wavefront;
computing an interference pattern between the simulated design input and output signals;
computationally deriving an arrangement of diffractive elements of a diffractive element set from the computed interference pattern;
forming an optical interconnect structure defining at least one optical source port, at least one optical receiver port, and at least one interconnect optical signal pathway connecting an optical signal source port and a corresponding optical signal receiver port;
forming as at least a portion of the optical interconnect structure an optical waveguide defining at least a portion of each interconnect optical signal pathway, the optical waveguide substantially confining in at least one transverse dimension optical signals propagating in two dimensions therein;
forming as a portion of each interconnect optical signal pathway at least one signal wavefront diffractive transformation region and the corresponding set of diffractive elements thereof according to the computationally derived arrangement,
wherein:
each diffractive element set is arranged for diffractively transforming a corresponding diffracted portion of a signal incident on the wavefront diffractive transformation region with the corresponding design input signal wavefront into a signal emergent from the diffractive transformation region with the corresponding design output signal wavefront; and
for at least one diffractive element set, only one of the corresponding design input signal wavefront or the corresponding design output signal wavefront is substantially confined in at least one transverse dimension by the optical waveguide, while another one of the corresponding design input signal wavefront or the corresponding design output signal wavefront propagates without substantial confinement by the optical waveguide.
9. The method of claim 8 , further comprising forming the set of diffractive elements in the signal wavefront diffractive transformation region according to the derived arrangement.
10. The method of claim 8 , wherein the arrangement of the diffractive elements of the diffractive element set is computationally derived at least in part from a phase function of an interferogram of the interference pattern.
11. The method of claim 10 , wherein the arrangement of the diffractive elements of the diffractive element set is derived from the phase function of the interferogram with a spatially-invariant intensity function thereof.
12. The method of claim 10 , wherein each element of the diffractive element set is defined with respect to a constant-phase-difference contour of the phase function of the interferogram.
13. The method of claim 10 , wherein the arrangement of the diffractive elements of the diffractive element set is derived from both the phase function of the interferogram and a spatially-varying intensity function thereof.
14. The method of claim 8 , wherein each of the simulated design input optical signal and the simulated design output optical signal comprises a continuous-wave optical signal.
15. A method for forming an optical apparatus, comprising:
forming an optical interconnect structure defining at least one optical source port, at least one optical receiver port, and at least one interconnect optical signal pathway connecting an optical signal source port and a corresponding optical signal receiver port;
forming as at least a portion of the optical interconnect structure an optical waveguide defining at least a portion of each interconnect optical signal pathway, the optical waveguide substantially confining in at least one transverse dimension optical signals propagating in two dimensions therein;
forming as a portion of each interconnect optical signal pathway at least one signal wavefront diffractive transformation region and a corresponding set of diffractive elements thereof;
arranging an optical source for launching an optical signal into the optical interconnect structure through the optical source port;
arranging an optical receiver for receiving an optical signal emerging from the optical interconnect structure through the corresponding optical receiver port; and
joining an electrical circuit to the optical interconnect structure, and operatively coupling electrical circuit to the optical source or the optical receiver,
wherein:
each diffractive element set is arranged for diffractively transforming a corresponding diffracted portion of a signal incident on the wavefront diffractive transformation region with a corresponding design input signal wavefront into a signal emergent from the diffractive transformation region with a corresponding design output signal wavefront;
for at least one diffractive element set, only one of the corresponding design input signal wavefront or the corresponding design output signal wavefront is substantially confined in at least one transverse dimension by the optical waveguide, while another one of the corresponding design input signal wavefront or the corresponding design output signal wavefront propagates without substantial confinement by the optical waveguide;
the optical interconnect structure and the electrical circuit comprise layers formed on at least one substrate; and
(i) the optical interconnect structure is between the electrical circuit and the substrate, (ii) the electrical circuit is between the optical interconnect structure and the substrate, (iii) the optical source or the optical receiver is integrally formed in the electrical circuit layer, or (iv) the optical interconnect structure comprises at least one layer formed on an interconnect substrate and the electrical circuit comprises at least one layer formed on an electrical circuit substrate.
16. The method of claim 15 , wherein the optical interconnect structure and the electrical circuit comprise layers formed on a substrate, and the optical interconnect structure is between the electrical circuit and the substrate.
17. The method of claim 15 , wherein the optical interconnect structure and the electrical circuit comprise layers formed on a substrate, and the electrical circuit is between the optical interconnect structure and the substrate.
18. The method of claim 15 , wherein the optical interconnect structure and the electrical circuit comprise layers formed on a substrate, and the optical source or the optical receiver is integrally formed in the electrical circuit layer.
19. The method of claim 15 , wherein:
the optical interconnect structure and the electrical circuit comprise layers formed on a semiconductor substrate;
the optical interconnect structure is between the electrical circuit and the substrate, or the electrical circuit is between the optical interconnect structure and the substrate;
the optical interconnect structure comprises at least one dielectric layer; and
the electrical circuit comprises at least one semiconductor layer.
20. The method of claim 19 , wherein the substrate comprises silicon or doped silicon, the electrical circuit comprises silicon or doped silicon or metal, and the optical interconnect structure comprises silica or doped silica.
21. The method of claim 15 , wherein the optical interconnect structure comprises at least one layer formed on an interconnect substrate, and the electrical circuit comprises at least one layer formed on an electrical circuit substrate.