Method of manufacturing a LCD using a photoresist with varying thickness
View Patent ↗The invention relates to a substrate for a liquid crystal display that forms a part of a display of an information apparatus and a liquid crystal display having the same. The invention provides a substrate for a liquid crystal display which contributes to suppression of an increase in the number of manufacturing steps and an increase in a manufacturing cost and which improves the yield of manufacture, a liquid crystal display having the same, and a method of manufacturing the same. There is provided a base substrate that sandwiches a liquid crystal in combination with an opposite substrate provided opposite thereto and having an electrode formed thereon, a plurality of gate bus lines formed on the base substrate, a plurality of drain bus lines formed such that they intersect with the gate bus lines with an insulation film interposed therebetween, a light-reflective pixel electrode formed in each pixel region on the base substrate, thin film transistors formed in the vicinity of positions where the gate bus lines and the drain bus lines intersect with each other, and a protective film formed of a photosensitive material on the drain bus lines.
1. A method of manufacturing a substrate for a liquid crystal display, comprising the steps of:
forming a metal layer to form drain bus lines, drain bus line terminals, and pixel electrodes on a base substrate;
forming a photosensitive material layer on the metal layer by applying a photosensitive material thereto;
exposing the photosensitive material layer above the pixel , electrodes and the drain bus line terminals with a low light exposure less than a required light exposure;
developing the photosensitive material layer to form an etching mask that is smaller in thickness in regions above the pixel electrodes and the drain bus line terminals than in regions above the drain bus lines;
etching the metal layer using the etching mask to form the drain bus lines, the drain bus line terminals, and the pixel electrodes; and
performing an ashing process to remove the etching mask on the pixel electrodes and the drain bus line terminals.
2. A method of manufacturing a substrate for a liquid crystal display according to claim 1 , wherein the low light exposure is substantially one-half of the required light exposure.
3. A method of manufacturing a substrate for a liquid crystal display according to claim 1 , wherein the step of exposing the photosensitive material is performed using a photo-mask having transmittance that varies between a drawing pattern for forming the pixel electrodes and the drain bus line terminals and a drawing pattern for forming the drain bus lines.
4. A method of manufacturing a substrate for a liquid crystal display according to claim 2 , wherein the step of exposing the photosensitive material is performed using a photo-mask having transmittance that varies between a drawing pattern for forming the pixel electrodes and the drain bus line terminals and a drawing pattern for forming the drain bus lines.